Defect engineering for control of polarization fatigue in Bi3.25La0.75Ti3O12 thin film capacitors

被引:1
作者
Singh, S. K. [1 ]
Ishiwara, H. [1 ]
机构
[1] Tokyo Inst Technol, Interdisciplinary Grad Sch Sci & Engn, Midori Ku, Yokohama, Kanagawa 2268503, Japan
基金
日本学术振兴会;
关键词
ferroelectric thin film; sol-gel deposition; micro-structure; defect engineering; fatigue behavior; (BiLa)(4)Ti3O12 (BLT); cerium-doping;
D O I
10.1080/10584580600657203
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Cerium-doped Bi3.25La0.75Ti3O12 (BLT) thin films were formed by depositing sol-gel solutions on Pt/Ti/SiO2/Si (100) structures. Partial replacement of La3+ by Ce3+ modified the lattice ordering but maintained bismuth-layered structure. The Ce4+ doping in BLT up to 5% of Ti atoms did not affect the single phase bismuth-layered structure but small modification was observed in structural orientation, which influenced the microstructure and ferroelectric properties of BLT films. Partial replacement of La3+ by Ce3+ decreased the remanent polarization but small (about 1% of Ti atoms) Ce4+ substitution enhanced the remanent polarization by about 20% in BLT films as well as it showed fatigueless response up to 10(10) switching cycles. The control of oxygen vacancies (defect engineering) influences the ferroelectric fatigue in the BLT films dramatically.
引用
收藏
页码:25 / 35
页数:11
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