A Compact Drain Current Model for Thin-Film Transistor Under Bias Stress Condition

被引:3
作者
Garcia, Rodolfo [1 ]
Mejia, Israel [2 ]
Tinoco, Julio [3 ]
Ezequiel Molinar-Solis, Jesus [4 ]
Morales, Alejandra [1 ]
Aleman, Miguel [5 ]
Sandoval, Sergio [4 ]
Quevedo-Lopez, Manuel A. [2 ]
机构
[1] Univ Autonoma Estado Mexico, Univ Ctr UAEM Ecatepec, Ecatepec De Morelos 55020, Mexico
[2] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75080 USA
[3] Univ Veracruzana, Micro & Nanotechnol Res Ctr, Boca Del Rio 94294, Mexico
[4] Inst Tecnol Ciudad Guzman, Guzman 49100, Mexico
[5] Inst Politecn Nacl, Mexico City Cdmx 07738, Mexico
基金
美国国家科学基金会;
关键词
Bias stress; channel conductivity; current instability; modeling; thin-film transistor (TFT); trapped charge; DEGRADATION; INSTABILITY; CIRCUIT; TFTS;
D O I
10.1109/TED.2018.2818694
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Several basic thin-film transistor (TFT) models have been developed to describe the electrical characteristics of the device, most of them only considering the fundamental instability effects during static mode operation. However, representing the dynamic behavior is also a major concern for circuit design due to the electrical stress changes over time. Under this scenario, empirical models have been previously demonstrated to reproduce the current instability effects under specific conditions, but they do not consider in detail the phenomena taking place when the TFT is under dynamic electrical stress. In this paper, a new semianalytical model is presented to describe the dynamical behavior of the TFT under stress. This model considers the impact of the negative charge trapped at interfacial states as well as the mobility degradation. To validate the model, we compare the results with experimental measurements from our group, (using CdS TFT), and other semiconductor TFTs (a-Si: H, SnO, IZO, and IGZO) reported by other authors.
引用
收藏
页码:1803 / 1809
页数:7
相关论文
共 25 条
  • [1] Mobility-and temperature-dependent device model for amorphous In-Ga-Zn-O thin-film transistors
    Abe, Katsumi
    Sato, Ayumu
    Takahashi, Kenji
    Kumomi, Hideya
    Kamiya, Toshio
    Hosono, Hideo
    [J]. THIN SOLID FILMS, 2014, 559 : 40 - 43
  • [2] Operation model with carrier-density dependent mobility for amorphous In-Ga-Zn-O thin-film transistors
    Abe, Katsumi
    Takahashi, Kenji
    Sato, Ayumu
    Kumomi, Hideya
    Nomura, Kenji
    Kamiya, Toshio
    Hosono, Hideo
    [J]. THIN SOLID FILMS, 2012, 520 (10) : 3791 - 3795
  • [3] Circuit-Level Impact of a-Si:H Thin-Film-Transistor Degradation Effects
    Allee, David R.
    Clark, Lawrence T.
    Vogt, Bryan D.
    Shringarpure, Rahul
    Venugopal, Sameer M.
    Uppili, Shrinivas Gopalan
    Kaftanoglu, Korhan
    Shivalingaiah, Hemanth
    Li, Zi P.
    Fernando, J. J. Ravindra
    Bawolek, Edward J.
    O'Rourke, Shawn M.
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2009, 56 (06) : 1166 - 1176
  • [4] Degradation of n-channel a-Si:H/nc-Si:H bilayer thin-film transistors under DC electrical stress
    Arpatzanis, N.
    Hatzopoulos, A. T.
    Tassis, D. H.
    Dimitriadis, C. A.
    Templier, F.
    Oudwan, M.
    Kamarinos, G.
    [J]. MICROELECTRONICS RELIABILITY, 2008, 48 (04) : 531 - 536
  • [5] Modeling the behavior of amorphous oxide thin film transistors before and after bias stress
    Cerdeira, A.
    Estrada, M.
    Soto-Cruz, B. S.
    Iniguez, B.
    [J]. MICROELECTRONICS RELIABILITY, 2012, 52 (11) : 2532 - 2536
  • [6] New procedure for the extraction of basic a-Si:H TFT model parameters in the linear and saturation regions
    Cerdeira, A
    Estrada, M
    García, R
    Ortiz-Conde, A
    Sánchez, FJG
    [J]. SOLID-STATE ELECTRONICS, 2001, 45 (07) : 1077 - 1080
  • [7] Gate-Bias Stress Stability of P-Type SnO Thin-Film Transistors Fabricated by RF-Sputtering
    Chiu, I-Chung
    Cheng, I-Chun
    [J]. IEEE ELECTRON DEVICE LETTERS, 2014, 35 (01) : 90 - 92
  • [8] Effects of channel thickness variation on bias stress instability of InGaZnO thin-film transistors
    Cho, Edward Namkyu
    Kang, Jung Han
    Yun, Ilgu
    [J]. MICROELECTRONICS RELIABILITY, 2011, 51 (9-11) : 1792 - 1795
  • [9] Analysis of Bias Stress Instability in Amorphous InGaZnO Thin-Film Transistors
    Cho, Edward Namkyu
    Kang, Jung Han
    Kim, Chang Eun
    Moon, Pyung
    Yun, Ilgu
    [J]. IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2011, 11 (01) : 112 - 117
  • [10] Electrical stress in CdS thin film transistors using HfO2 gate dielectric
    Garcia, R.
    Mejia, I.
    Molinar-Solis, J. E.
    Salas-Villasenor, A. L.
    Morales, A.
    Garcia, B.
    Quevedo-Lopez, M. A.
    Aleman, M.
    [J]. APPLIED PHYSICS LETTERS, 2013, 102 (20)