Underpotential deposition of cadmium onto (111) face of silver from chloride containing solution

被引：22

作者：

Jovic, VD ^{[1
]}

Jovic, BM ^{[1
]}

机构：

[1] Drexel Univ, Dept Mat Engn, Philadelphia, PA 19104 USA

来源：

ELECTROCHIMICA ACTA | 2002年 / 47卷 / 11期

关键词：

Ag(111); underpotential deposition; cadmium; chloride adsorption; ordered structure; Ag-Cd alloying;

D O I：

10.1016/S0013-4686(02)00020-8

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The underpotential deposition (UPD) of cadmium and Ag-Cd alloy formation on the (111) face of silver in chloride containing solutions, ere investigated by cyclic voltammetry and the potentiostatic pulse technique. It as shown that the UPD of cadmium commences at about -400 mV versus SCE (300 mV vs. Cd2+/Cd) with the formation of ordered structure of the tape (root3xroot3)R30degrees. Chloride adatoms, which are adsorbed on the silver substrate when UPD of Cd starts, do not desorb. They become replaced by Cd adatoms and remain adsorbed and discharged on top of a Cd layer. At potentials close to the reversible potential of Cd allowing of Ag with Cd takes place, being expressed by two sharp cathodic peaks on the voltammograms. (C) 2002 Elsevier Science Ltd. All rights reserved.

引用

页码：1777 / 1785

页数：9

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