Epitaxial growth of LiNbO3 on αAl2O3(0001)

被引:0
|
作者
Veignant, F [1 ]
Gandais, M [1 ]
Aubertl, P [1 ]
Garry, G [1 ]
机构
[1] Univ Paris 06, Lab Mineral Cristallog Paris, CNRS UMR 7590, F-75252 Paris 05, France
关键词
pulsed laser deposition; transmission electron microscopy; LiNbO3; alpha Al2O3; thin film growth; strains;
D O I
暂无
中图分类号
O414.1 [热力学];
学科分类号
摘要
LiNbO3 films have been grown on alpha Al2O3(0001) by pulsed laser deposition. Their structural aspects have been studied by using transmission electron microscopy. Different stages of the film formation have been observed: nucleation-growth of isolated pyramids limited by the {01 (1) over bar 2} faces, coalescence of the pyramids giving rise to Aat aggregates and formation of continuous films. Misfit dislocations relaxing the misfit strain at the deposition temperature have been observed. However, strain states have been found. They are dependent on the film morphology: inhomogeneous elastic strain field in isolated pyramids, mechanical twinning and cracks in continuous films. It is shown that in both cases, the strain state corresponds to the relaxation of stresses occurring at the film/substrate interface during the cooling stage from deposition to room temperature, due to a large difference in thermal expansion coefficients of LiNbO3 and alpha Al2O3. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:163 / 167
页数:5
相关论文
共 50 条
  • [21] Epitaxial relationships between GaN and Al2O3(0001) substrates
    Grandjean, N
    Massies, J
    Vennegues, P
    Laugt, M
    Leroux, M
    APPLIED PHYSICS LETTERS, 1997, 70 (05) : 643 - 645
  • [22] EPITAXIAL GROWTH OF AL2O3 ON AL2O3 SUBSTRATES BY CHEMICAL VAPOR DEPOSITION
    MESSIER, DR
    WONG, P
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (05) : 772 - &
  • [23] Epitaxial growth of Au(111) on α-Al2O3(0001) by using a Co seed layer
    Kamiko, Masao
    Yamamoto, Ryoichi
    JOURNAL OF CRYSTAL GROWTH, 2006, 293 (01) : 216 - 222
  • [24] Epitaxial Al2O3(0001)/Cu(111) Template Development for CVD Graphene Growth
    Verguts, Ken
    Vermeulen, Bart
    Vrancken, Nandi
    Schouteden, Koen
    Van Haesendonck, Chris
    Huyghebaert, Cedric
    Heyns, Marc
    De Gendt, Stefan
    Brems, Steven
    JOURNAL OF PHYSICAL CHEMISTRY C, 2016, 120 (01): : 297 - 304
  • [25] Epitaxial growth of hcp/fcc Co bilayer films on Al2O3(0001) substrates
    Ohtake, Mitsuru
    Futamoto, Masaaki
    Kirino, Fumiyoshi
    Fujita, Norihito
    Inaba, Nobuyuki
    JOURNAL OF APPLIED PHYSICS, 2008, 103 (07)
  • [26] Buffer-facilitated epitaxial growth of AlN on Al2O3(0001) at room temperature
    Lin, YR
    Wu, ST
    SURFACE SCIENCE, 2002, 516 (03) : L535 - L539
  • [27] Epitaxial growth and electrochemical transfer of graphene on Ir(111)/α-Al2O3(0001) substrates
    Koh, Shinji
    Saito, Yuta
    Kodama, Hideyuki
    Sawabe, Atsuhito
    APPLIED PHYSICS LETTERS, 2016, 109 (02)
  • [28] Epitaxial growth of Mn-doped ZnO thin films on Al2O3 (0001)
    Vaithianathan, V
    Je, JH
    Lee, BT
    Kim, SS
    DESIGNING, PROCESSING AND PROPERTIES OF ADVANCED ENGINEERING MATERIALS, PTS 1 AND 2, 2004, 449-4 : 493 - 496
  • [29] Growth-rate induced epitaxial orientation of CeO2 on Al2O3(0001)
    Kuchibhatla, Satyanarayana V. N. T.
    Nachimuthu, P.
    Gao, F.
    Jiang, W.
    Shutthanandan, V.
    Engelhard, M. H.
    Seal, S.
    Thevuthasan, S.
    APPLIED PHYSICS LETTERS, 2009, 94 (20)
  • [30] Role of substrate step bunches on the growth behavior of LiNbO3 thin film on α-Al2O3 substrate
    Lee, Geun-Hyoung
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 138 (01): : 41 - 45