The Effects of N2 Flow Rates on the Properties of Ti-Al-Si-N Films Deposited by Arc Ion Plating

被引：1

作者：

Feng, Changjie ^{[1
]}

Xin, Li ^{[2
]}

Zhu, Shenglong ^{[2
]}

Shao, Zhisong ^{[1
]}

机构：

[1] Nanchang Hangkong Univ, Sch Mat Sci & Engn, Nanchang 330063, Peoples R China

[2] Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China

来源：

ADVANCES IN ENERGY SCIENCE AND TECHNOLOGY, PTS 1-4 | 2013年 / 291-294卷

基金：

中国国家自然科学基金;

关键词：

Ti-Al-Si-N films; N-2 flow rate; microstructure; microhardness; adhesion property;

D O I：

10.4028/www.scientific.net/AMM.291-294.2694

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Ti-Al-Si-N films were deposited on 1Crl 1Ni2W2MoV steel at different N-2 flow rates from 0 to 600 sccm by AIP using a Ti60Al30Si10 target. The effects of the N-2 flow rates on the deposition rate, composition, microstructure, microhardness and adhesion property of the films were investigated by SEM/EDS, XRD, microhardness and scratch tests, respectively. The results show that the deposition rate of the films decreased initially and then began to increase at N-2 flow rate higher than 300 sccm. The microhardness of the films increased with the N-2 flow rate except a slight drop at 450sccm. The evolution of adhesion property of the films was very similar to that of microhardness. All the Ti-Al-Si-N films had B1 NaCl structure with (220) preferred orientation except that at 600 sccm. The effects of the N-2 flow rate on the properties of the Ti-Al-Si-N films were discussed.

引用

页码：2694 / +

页数：2

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