Room-Temperature H2 Gas Sensing Characterization of Graphene-Doped Porous Silicon via a Facile Solution Dropping Method

被引:20
作者
Eom, Nu Si A. [1 ]
Cho, Hong-Baek [1 ]
Song, Yoseb [1 ]
Lee, Woojin [2 ]
Sekino, Tohru [3 ]
Choa, Yong-Ho [1 ]
机构
[1] Hanyang Univ, Dept Fus Chem Engn, Ansan 15588, South Korea
[2] Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Samsungjeonja Ro 1, Hwaseong 445330, Gyeonggi Do, South Korea
[3] Osaka Univ, Inst Sci & Ind Res, 8-1 Mihogaoka, Ibaraki, Osaka 5670047, Japan
基金
新加坡国家研究基金会;
关键词
graphene-doped porous silicon; p-type silicon; hydrogen sensor; sensing mechanism; SENSOR;
D O I
10.3390/s17122750
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
In this study, a graphene-doped porous silicon (G-doped/p-Si) substrate for low ppm H-2 gas detection by an inexpensive synthesis route was proposed as a potential noble graphene-based gas sensor material, and to understand the sensing mechanism. The G-doped/p-Si gas sensor was synthesized by a simple capillary force-assisted solution dropping method on p-Si substrates, whose porosity was generated through an electrochemical etching process. G-doped/p-Si was fabricated with various graphene concentrations and exploited as a H-2 sensor that was operated at room temperature. The sensing mechanism of the sensor with/without graphene decoration on p-Si was proposed to elucidate the synergetic gas sensing effect that is generated from the interface between the graphene and p-type silicon.
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页数:7
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