XeF2/Fluoride Acceptors as Versatile One-Electron Oxidants

被引：35
作者：
Poleschner, Helmut [1 ]
Seppelt, Konrad [1 ]
机构：
[1] Free Univ Berlin, Inst Chem & Biochem, D-14195 Berlin, Germany
来源：
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2013年 / 52卷 / 49期
关键词：
anions; fluorine; one-electron oxidants; xenon; X-ray diffraction; WEAKLY COORDINATING ANIONS; CRYSTAL-STRUCTURES; ANODIC-OXIDATION; 1ST ISOLATION; CATIONS; PHOSPHORUS; SALTS; STABILIZATION; REACTIVITY; FLUORIDES;
D O I：
10.1002/anie.201307161
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
No phlogiston but xenon is released when XeF2/F- acceptors act as new one-electron oxidants. F- acceptors are Lewis acids BF3, B(C6F5)3, and Al{OC(CF3)3}3, and silyl derivatives TfOSiMe3, Tf2NSiMe3, Me3Si + B(C6F5)4-, and Me 3Si+ CHB11Cl11-. The anions BF4-, TfO-, Tf2N-, FB(C6F5)3-, FAl{OC(CF 3)3}3-, B(C6F 5)4-, or CHB11Cl11 - can be introduced into oxidation products of R2E 2 (E=S, Se, Te), [FeCp2], [(FeCpS)4], tetrathiafulvalene, thianthrene, and (2,4-Br2C6H 3)3N. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码：12838 / 12842
页数：5
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