Dielectric nanostructures with high laser damage threshold

被引：1

作者：

Ngo, C. Y. ^{[1
]}

Hong, L. Y. ^{[2
]}

Deng, J. ^{[1
,3
]}

Khoo, E. H.

Liu, Z.

Wu, R. F. ^{[4
]}

Teng, J. H. ^{[1
]}

机构：

[1] Inst Mat Res & Engn, Singapore, Singapore

[2] Nanyang Technol Univ, Singapore, Singapore

[3] Inst High Performance Comp, Singapore, Singapore

[4] DSO Natl Labs, Singapore, Singapore

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2017年 / 123卷 / 02期

关键词：

METAMATERIALS; GENERATION; RESONANCES;

D O I：

10.1007/s00339-016-0751-y

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Dielectric-based metamaterials are proposed to be the ideal candidates for low-loss, high-efficiency devices. However, to employ dielectric nanostructures for high-power applications, the dielectric material must have a high laser-induced damaged threshold (LIDT) value. In this work, we investigated the LIDT values of dielectric nanostructures for high-power fiber laser applications. Consequently, we found that the fabricated SiO2 nanostructured lens can withstand laser fluence exceeding 100 J/cm(2).

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页数：5

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