Using multiscaling analysis, we compare the characteristic roughening of ferroelectric domain walls in Pb(Zr0.2Ti0.8)O-3 thin films with numerical simulations of weakly pinned one-dimensional interfaces. Although at length scales up to L-MA >= 5 mu m the ferroelectric domain walls behave similarly to the numerical interfaces, showing a simple monoaffine scaling (with a well-defined roughness exponent zeta), we demonstrate more complex scaling at higher length scales, making the walls globally multiaffine (varying zeta at different observation length scales). The dominant contributions to this multiaffine scaling appear to be very localized variations in the disorder potential, possibly related to dislocation defects present in the substrate.
机构:
ICREA, Barcelona 08193, Spain
CSIC ICN, Ctr Invest Nanociencia Nanotecnol CIN2, Barcelona 08193, SpainICREA, Barcelona 08193, Spain
Catalan, G.
;
Seidel, J.
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Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
Univ New S Wales, Sch Mat Sci & Engn, Sydney, NSW 2052, AustraliaICREA, Barcelona 08193, Spain
Seidel, J.
;
Ramesh, R.
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h-index: 0
机构:
Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USAICREA, Barcelona 08193, Spain
机构:
ICREA, Barcelona 08193, Spain
CSIC ICN, Ctr Invest Nanociencia Nanotecnol CIN2, Barcelona 08193, SpainICREA, Barcelona 08193, Spain
Catalan, G.
;
Seidel, J.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
Univ New S Wales, Sch Mat Sci & Engn, Sydney, NSW 2052, AustraliaICREA, Barcelona 08193, Spain
Seidel, J.
;
Ramesh, R.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USAICREA, Barcelona 08193, Spain