A novel method of ultraviolet/NaClO2-NH4OH for NO removal: Mechanism and kinetics

被引:95
作者
Hao, Runlong [1 ,2 ]
Mao, Xingzhou [1 ,2 ]
Wang, Zheng [1 ]
Zhao, Yi [1 ,2 ]
Wang, Tianhao [1 ,2 ]
Sun, Zhonghao [1 ,2 ]
Yuan, Bo [1 ,2 ]
Li, Yankun [1 ,2 ]
机构
[1] North China Elect Power Univ, Sch Environm Sci & Engn, Baoding 071003, Peoples R China
[2] Minist Educ, Key Lab Resources & Environm Syst Optimizat, Beijing 102206, Peoples R China
关键词
NO removal; AOP method; Hydroxyl radical; Oxychloride radical; Kinetics; FLUE-GAS; CHLORINE DIOXIDE; SIMULTANEOUS ABSORPTION; INTEGRATIVE PROCESS; OXIDATION REMOVAL; SODIUM-CHLORITE; NITRIC-OXIDE; SO2; UV/CHLORINE; DEGRADATION;
D O I
10.1016/j.jhazmat.2019.01.042
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
The key step for nitric oxide (NO) removal using oxidation method is to efficiently oxidize NO. This study developed a novel advanced oxidation process (AOP) of ultraviolet light (UV) catalysis of chlorite (NaC102) to oxidize NO. The production of nitric dioxide (NO2) and photo-production of chlorine dioxide (C102) were suppressed by adding ammonium hydroxide (NH4OH). The NO conversion efficiency was 98.1% using UV/ NaClO2-NH4OH. Electron spin resonance (ESR) tests confirmed the roles of hydroxyl radical (HO') and oxychloride radical (ClO2/Cl2O2) in the oxidation of NO. Kinetics analyses showed that NO flux was significantly enhanced by radical-induced (HO-/ClO) oxidation of NO. In the presence of UV, the overall reaction rates (k,,1*) were 3-8 times higher than those without UV. The Hatta number, namely the enhanced factor, was calculated in the range of 229-403 and 730-780 corresponding to without and with UV light, suggesting that NO oxidation belonged to fast and/or instantaneous reaction. Thus, the gas-film mass transfer resistance was the rate-determining step. N-containing product was determined as NH4+ and NO3- according to X-ray photoelectron spectroscopy ()CPS).
引用
收藏
页码:234 / 242
页数:9
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