Correlation of Extended Defects on Carrier Lifetime in Thick SiC Epilayers

被引:4
作者
Mahadik, Nadeemullah A. [1 ]
Stahlbush, Robert E. [1 ]
Caldwell, Joshua D. [1 ]
O'Loughlin, Michael [2 ]
Burk, Albert [2 ]
机构
[1] USN, Res Lab, 4555 Overlook Ave, Washington, DC 20375 USA
[2] Creare Res & Dev Inc, Durham, NC 27703 USA
来源
SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2 | 2012年 / 717-720卷
关键词
Carrier Lifetime; Extended Defects; High power; DISLOCATIONS;
D O I
10.4028/www.scientific.net/MSF.717-720.297
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effect of extended defects on carrier lifetime was investigated in 140 pm thick 4H-SiC epilayers using whole wafer ultraviolet photoluminescence (UVPL) and microwave photoconductive decay (mu PCD) mapping. Half-loop arrays (HLA) seen in the UVPL images showed a corresponding lifetime degradation in the same region, even before expansion of the HLAs to form SFs. Lifetime lowering was also seen for a defect comprising of a small 3C-SiC inclusion with a larger misoriented 4H-SiC region. Additionally, formation of slip planes after high temperature annealing was observed, which consequently shows a lifetime reduction in that region.
引用
收藏
页码:297 / +
页数:2
相关论文
共 12 条
[1]   Crystal defects as source of anomalous forward voltage increase of 4H-SiC diodes [J].
Bergman, JP ;
Lendenmann, H ;
Nilsson, PÅ ;
Lindefelt, U ;
Skytt, P .
SILICON CARBIDE AND RELATED MATERIALS, ECSCRM2000, 2001, 353-356 :299-302
[2]   Influence of structural defects on carrier lifetime in 4H-SiC epitaxial layers: Optical lifetime mapping [J].
Hassan, J. ;
Bergman, J. P. .
JOURNAL OF APPLIED PHYSICS, 2009, 105 (12)
[3]   Reduction of Deep Levels and Improvement of Carrier Lifetime in n-Type 4H-SiC by Thermal Oxidation [J].
Hiyoshi, Toru ;
Kimoto, Tsunenobu .
APPLIED PHYSICS EXPRESS, 2009, 2 (04) :0411011-0411013
[4]   Impacts of recombination at the surface and in the substrate on carrier lifetimes of n-type 4H-SiC epilayers [J].
Kimoto, Tsunenobu ;
Hiyoshi, Toru ;
Hayashi, Toshihiko ;
Suda, Jun .
JOURNAL OF APPLIED PHYSICS, 2010, 108 (08)
[5]   Operation of a 2500V 150A Si-IGBT/SiC diode module [J].
Lendenmann, H ;
Johansson, N ;
Mou, D ;
Frischholz, M ;
Åstrand, B ;
Isberg, P ;
Ovren, C .
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 :1423-1426
[6]   Structure and Morphology of Inclusions in 4° Offcut 4H-SiC Epitaxial Layers [J].
Mahadik, Nadeemullah A. ;
Stahlbush, Robert E. ;
Qadri, Syed B. ;
Glembocki, Orest J. ;
Alexson, Dimitri A. ;
Hobart, Karl D. ;
Caldwell, Joshua D. ;
Myers-Ward, Rachael L. ;
Tedesco, Joseph L. ;
Eddy, Charles R., Jr. ;
Gaskill, D. Kurt .
JOURNAL OF ELECTRONIC MATERIALS, 2011, 40 (04) :413-418
[7]   CL/EBIC-SEM techniques for evaluation of impact of crystallographic defects on carrier lifetime in 4H-SiC epitaxial layers [J].
Maximenko, S. I. ;
Freitas, J. A., Jr. ;
Picard, Y. N. ;
Klein, P. B. ;
Myers-Ward, R. L. ;
Lew, K. -K. ;
Muzykov, P. G. ;
Gaskill, D. K. ;
Eddy, C. R., Jr. ;
Sudarshan, T. S. .
SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 :211-+
[8]   Evaluation of long carrier lifetimes in thick 4H silicon carbide epitaxial layers [J].
Miyazawa, Tetsuya ;
Ito, Masahiko ;
Tsuchida, Hidekazu .
APPLIED PHYSICS LETTERS, 2010, 97 (20)
[9]   Whole-wafer mapping of dislocations in 4H-SiC epitaxy [J].
Stahlbush, R. E. ;
Liu, K. X. ;
Zhang, Q. ;
Sumakeris, J. J. .
SILICON CARBIDE AND RELATED MATERIALS 2006, 2007, 556-557 :295-+
[10]   Evolution of Basal Plane Dislocations During 4H-SiC Epitaxial Growth [J].
Stahlbush, R. E. ;
VanMil, B. L. ;
Liu, Kx ;
Lew, K. K. ;
Myers-Ward, R. L. ;
Gaskill, D. K. ;
Eddy, C. R., Jr. ;
Zhang, X. ;
Skowronski, M. .
SILICON CARBIDE AND RELATED MATERIALS 2007, PTS 1 AND 2, 2009, 600-603 :317-+