Electrodeposition of Ferromagnetic FeCo and FeCoMn Alloy from Choline Chloride Based Deep Eutectic Solvent

被引：16
作者：
Sides, William [1 ]
Kassouf, Nikolas [1 ]
Huang, Qiang [1 ,2 ]
机构：
[1] Univ Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
[2] Univ Alabama, Ctr Mat Informat Technol, Tuscaloosa, AL 35487 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2019年 / 166卷 / 04期
关键词：
IONIC LIQUID; CO-FE; ELECTROPLATED MATERIALS; MAGNETIC-PROPERTIES; ETHYLENE-GLYCOL; THIN-FILMS; UREA; SOFT; MN; CORROSION;
D O I：
10.1149/2.0181904jes
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The electrodeposition of Fe, Co, FeCo, and FeCoMn alloy films has been performed from the choline chloride/urea deep eutectic solvent without additives. The effects of solution temperature, electrolyte concentration, deposition potential, and solution agitation on deposition rate have been studied. Film composition, morphology, crystallographic structure as well as the magnetic moment and coercivity were characterized and compared against the deposition conditions. A dominant mass transport effect was observed across most of the deposition cases. A manganese underpotential deposition phenomenon occurred with the alloy deposition. An elevated temperature results in significantly faster deposition and promotes smooth film growth with limited cracking. As-deposited FeCo alloy films are found to be ferromagnetic and nanocrystalline. (C) The Author(s) 2019. Published by ECS.
引用
收藏
页码：D77 / D85
页数：9
相关论文
共 38 条
[1]   Ionometallurgy: designer redox properties for metal processing [J].
Abbott, A. P. ;
Frisch, G. ;
Gurman, S. J. ;
Hillman, A. R. ;
Hartley, J. ;
Holyoak, F. ;
Ryder, K. S. .
CHEMICAL COMMUNICATIONS, 2011, 47 (36) :10031-10033
[2]   Aluminium electrodeposition under ambient conditions [J].
Abbott, Andrew P. ;
Harris, Robert C. ;
Hsieh, Yi-Ting ;
Ryder, Karl S. ;
Sun, I-Wen .
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2014, 16 (28) :14675-14681
[3]   Electrodeposition of copper composites from deep eutectic solvents based on choline chloride [J].
Abbott, Andrew P. ;
El Ttaib, Khalid ;
Frisch, Gero ;
McKenzie, Katy J. ;
Ryder, Karl S. .
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2009, 11 (21) :4269-4277
[4]   Future directions in electroplated materials for thin-film recording heads [J].
Andricacos, PC ;
Robertson, N .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1998, 42 (05) :671-680
[5]  
Bernasconi R., 2017, PROGR DEV IONIC LIQU
[6]  
Bozorth R.M, 1993, FERROMAGNETISM, P992
[7]   Recent developments in high-moment electroplated materials for recording heads [J].
Cooper, EI ;
Bonhôte, C ;
Heidmann, J ;
Hsu, Y ;
Kern, P ;
Lam, JW ;
Ramasubramanian, M ;
Robertson, N ;
Romankiw, LT ;
Xu, H .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2005, 49 (01) :103-126
[8]   Effect of water presence on choline chloride-2urea ionic liquid and coating platings from the hydrated ionic liquid [J].
Du, Cuiling ;
Zhao, Binyuan ;
Chen, Xiao-Bo ;
Birbilis, Nick ;
Yang, Haiyan .
SCIENTIFIC REPORTS, 2016, 6
[9]  
Endres F, 2002, CHEMPHYSCHEM, V3, P144, DOI 10.1002/1439-7641(20020215)3:2<144::AID-CPHC144>3.0.CO
[10]  
2-#
1234