Optimization of pulsed laser deposited ZnO thin-film growth parameters for thin-film transistors (TFT) application

In this work we present the optimization of zinc oxide (ZnO) film properties for a thin-film transistor (TFT) application. Thin films, 50 +/- 10 nm, of ZnO were deposited by Pulsed Laser Deposition (PLD) under a variety of growth conditions. The oxygen pressure, laser fluence, substrate temperature and annealing conditions were varied as a part of this study. Mobility and carrier concentration were the focus of the optimization. While room-temperature ZnO growths followed by air and oxygen annealing showed improvement in the (002) phase formation with a carrier concentration in the order of 10(17)-10(18)/cm(3) with low mobility in the range of 0.01-0.1 cm(2)/V s, a Hall mobility of 8 cm(2)/V s and a carrier concentration of 5x10(14)/cm(3) have been achieved on a relatively low temperature growth (250 A degrees C) of ZnO. The low carrier concentration indicates that the number of defects have been reduced by a magnitude of nearly a 1000 as compared to the room-temperature annealed growths. Also, it was very clearly seen that for the (002) oriented films of ZnO a high mobility film is achieved.