Modeling of chemical vapor deposition in a fluidized bed reactor based on discrete particle simulation

被引:0
作者
Czok, G [1 ]
Ye, M
Kuipers, JAMH
Werther, J
机构
[1] Hamburg Univ Technol, Hamburg, Germany
[2] Univ Twente, NL-7500 AE Enschede, Netherlands
关键词
chemical vapor deposition; discrete particle modeling; fluidized bed reactor; particle coating;
D O I
暂无
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
For better understanding the process of particle coating by chemical vapor deposition (CVD) in the fluidized bed, the simulation of the deposition process was combined with a discrete particle model (DPM). Based on the experimental results of the thermal decomposition of tri-isobutyl-aluminum (TIBA) to produce aluminum onto glass beads, mechanisms on the micro-scale were investigated by single particle tracking. Zones of excessive growth as well as zones of insufficient mixing were identified. In particular, the take-up of aluminum was traced for selected particles that exhibited a large mass of deposited aluminum what in turn provides insight into the homogeneity and quantity of the coating throughout the bed material.
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页数:27
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