Rapid hot embossing of polymer microfeatures

被引:65
作者
Kimerling, Thomas E.
Liu, Weidan
Kim, Byung H. [1 ]
Yao, Donggang
机构
[1] Univ Massachusetts, Dept Mech & Ind Engn, Amherst, MA 01003 USA
[2] Georgia Inst Technol, Sch Polymer Textile & Fiber Engn, Atlanta, GA 30332 USA
来源
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2006年 / 12卷 / 08期
关键词
D O I
10.1007/s00542-006-0098-y
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Although the hot embossing process is gaining popularity in molding polymer micro/nano structures, it needs a breakthrough improvement in reducing cycle time before it can become a mass-production process. In this study, an embossing tool with a rapid heating and cooling capability was investigated to reduce the cycle time. During the process, the embossing tool was rapidly heated to above the polymer softening temperature (in less than a couple of seconds), pressed against a room-temperature polymer substrate, and subsequently rapidly cooled for mold separation. Different miniaturized features including microsquare and hexagonal wells, microcircular holes, and submicron surface features were successfully produced using the new process with a total embossing cycle time around 20 s. The fatigue test result indicated that the new embossing technology is durable and reliable for microscale feature replication.
引用
收藏
页码:730 / 735
页数:6
相关论文
共 21 条
  • [1] Polymer microfluidic devices
    Becker, H
    Locascio, LE
    [J]. TALANTA, 2002, 56 (02) : 267 - 287
  • [2] Innovations in molding technologies for microfabrication
    Benzler, T
    Piotter, V
    Hanemann, T
    Mueller, K
    Norajitra, P
    Ruprecht, R
    Hausselt, J
    [J]. MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY V, 1999, 3874 : 53 - 60
  • [3] Chang JH, 2005, MICROSYST TECHNOL, V11, P396, DOI 10.1007/S00542-004-0481-5
  • [4] Eliminating flow induced birefringence and minimizing thermally induced residual stresses in injection molded parts
    Chen, M
    Yao, DG
    Kim, B
    [J]. POLYMER-PLASTICS TECHNOLOGY AND ENGINEERING, 2001, 40 (04) : 491 - 503
  • [5] CHEN SC, 2005, HOT EMBOSSING MICROF, P698
  • [6] Imprint lithography with sub-10 nm feature size and high throughput
    Chou, SY
    Krauss, PR
    [J]. MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 237 - 240
  • [7] Sub-10 nm imprint lithography and applications
    Chou, SY
    Krauss, PR
    Zhang, W
    Guo, LJ
    Zhuang, L
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06): : 2897 - 2904
  • [8] GREWELL D, 2003, FEASIBILITY SELECTED, P1094
  • [9] Hot embossing in polymers as a direct way to pattern resist
    Jaszewski, RW
    Schift, H
    Gobrecht, J
    Smith, P
    [J]. MICROELECTRONIC ENGINEERING, 1998, 42 : 575 - 578
  • [10] LOW THERMAL INERTIA MOLDING (LTIM)
    KIM, BH
    SUH, NP
    [J]. POLYMER-PLASTICS TECHNOLOGY AND ENGINEERING, 1986, 25 (01) : 73 - 93