Polarization insensitive silicon immersion grating based on total internal reflection

被引:2
作者
Higuchi, Yuichi [1 ]
Ishii, Yuzo [1 ]
Hadama, Koichi [1 ]
Yamaguchi, Joji [1 ]
Yamamoto, Tsuyoshi [1 ]
机构
[1] NTT Corp, NTT Microsyst Integrat Labs, Atsugi, Kanagawa 2430198, Japan
来源
OPTICS EXPRESS | 2013年 / 21卷 / 08期
关键词
INFRARED ASTRONOMY; HIGH-EFFICIENCY; WAVELENGTH;
D O I
10.1364/OE.21.009664
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We describe an immersion grating (IG) with both low polarization-dependent loss (PDL) and high diffraction efficiency. Our immersion grating consists of a silicon (Si) prism and a Si grating coated with dielectric film. We analyze the effect of the refractive index of dielectric film and clarify the refractive index ratio between a Si grating and dielectric film. Selecting an adequate material for the dielectric film, we design the diffraction efficiency of TM polarization without changing that of TE polarization. The simulation results for the optimized IG show a PDL of 0.2 dB and diffraction efficiency of -0.4 dB. A prototype with high dispersion power provides a low PDL of 0.6 dB, while maintaining a high diffraction efficiency of -0.4 dB. (C) 2013 Optical Society of America
引用
收藏
页码:9664 / 9673
页数:10
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