iR drop correction in electrocatalysis: everything one needs to know!

被引:74
作者
Anantharaj, Sengeni [1 ,2 ]
Noda, Suguru [1 ,2 ]
机构
[1] Waseda Univ, Sch Adv Sci & Engn, Dept Appl Chem, Shinjuku Ku, 3-4-1 Okubo, Tokyo 1698555, Japan
[2] Waseda Univ, Waseda Res Inst Sci & Engn, Shinjuku Ku, 3-4-1 Okubo, Tokyo 1698555, Japan
关键词
WATER; PARAMETERS;
D O I
10.1039/d2ta01393b
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Direct current (DC) voltammetric techniques in which the potential is controlled while the response is measured as current are in use for decades now in the screening of electrocatalysts used in energy conversion devices, sensors, and electrolyzers despite being inferior in many ways to alternating current (AC) techniques and other advanced voltammetric techniques because of their simplicity to use and handle resultant data. One of the major issues with the controlled-potential DC techniques where the applied potential is controlled by means of a reference electrode is the potential drop at the interface. This drop in potential affects the obtained results to an inconceivably greater extent in some cases. Hence, this drop in potential is manually corrected by following Ohm's law. However, there exists a pile of miscalculated potential drop corrections in the literature because of the challenges in understanding them and the unawareness of the protocols that need to be followed. To help the beginners of this field, this article is dedicated to defining and elaborating a potential drop, the factors influencing it, commonly made mistakes, and best practices.
引用
收藏
页码:9348 / 9354
页数:7
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