ASSESSMENT OF THE HOLLAND MODEL FOR SILICON PHONON-PHONON RELAXATION TIMES USING LATTICE DYNAMICS CALCULATIONS

被引：0

作者：

Zhu, Zimu ^{[1
]}

Sellan, Daniel P. ^{[1
]}

Nabovati, Aydin ^{[1
]}

Amon, Cristina H. ^{[1
]}

机构：

[1] Univ Toronto, Div Engn Sci, Toronto, ON M5S 3G8, Canada

来源：

PROCEEDINGS OF THE ASME INTERNATIONAL MECHANICAL ENGINEERING CONGRESS AND EXPOSITION, 2011, VOL 10, PTS A AND B | 2012年

关键词：

THERMAL-CONDUCTIVITY; DISPERSION;

D O I：

暂无

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

We assess the ability of the Holland model to accurately predict phonon-phonon relaxation times from bulk thermal conductivity values. Lattice dynamics calculations are used to obtain phonon-phonon relaxation times and thermal conductivities for temperatures ranging from 10 to 1000 K for Stillinger-Weber silicon. The Holland model is then fit to these thermal conductivities and used to predict relaxation times, which are compared to the relaxation times obtained by lattice dynamics calculations. We find that fitting the Holland model to both total and mode-dependent thermal conductivities does not result in accurate mode-dependent phonon-phonon relaxation times.

引用

页码：323 / 326

页数：4

共 10 条

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