[Zr(NEtMe)2(guan-NEtMe)2] as a Novel Atomic Layer Deposition Precursor: ZrO2 Film Growth and Mechanistic Studies

[Zr(NEtMe)(2)(guan-NEtMe2)(2)], a recently developed compound, was investigated as a novel precursor for the atomic layer deposition (ALD) of ZrO2. With water as the oxygen source, the growth rate remained constant over a wide temperature range, whereas with ozone the growth rate increased steadily with deposition temperature. Both ALD processes were successfully developed: the characteristic self-limiting ALD growth mode was confirmed at 300 degrees C. The growth rates were exceptionally high, 0.9 and 1.15 angstrom/cycle with water and ozone, respectively. X-ray diffraction (XRD) indicated that the films were deposited in the high-permittivity cubic phase, even when grown at temperatures as low as 250 degrees C. Compositional analysis performed by means of X-ray photoelectron spectroscopy (XPS) demonstrated low carbon and nitrogen contamination (<2 at. % when deposited with ozone). The films presented low root-mean-square (rms) roughness, below 5% of the film thickness, as well as excellent step coverage and conformality on 30:1 aspect ratio trench structures. Dielectric characterization was performed on ZrO2 metal insulator metal (MIM) capacitors and demonstrated high permittivity and low leakage current, as well as good stability of the capacitance. The ALD reaction mechanism was studied in situ: adsorption of the precursor through reaction of the two guan-NEtMe2 ligands with the surface -OD groups was confirmed by the quartz crystal microbalance (QCM) and quadrupole mass spectrometric (QMS) results.