Comment on "Diffusion of n-type dopants in germanium" [Appl. Phys. Rev. 1, 011301 (2014)]

被引:4
作者
Cowern, N. E. B. [1 ]
Simdyankin, S. [1 ]
Goss, J. P. [1 ]
Napolitani, E. [2 ,3 ]
De Salvador, D. [2 ,3 ]
Bruno, E. [4 ,5 ]
Mirabella, S. [4 ,5 ]
Ahn, C. [6 ]
Bennett, N. S. [7 ]
机构
[1] Newcastle Univ, Sch Elect & Elect Engn, Newcastle Upon Tyne NE1 7RU, Tyne & Wear, England
[2] Univ Padua, CNR IMM MATIS, I-35131 Padua, Italy
[3] Univ Padua, Dipartimento Fis, I-35131 Padua, Italy
[4] Univ Catania, CNR IMM MATIS, I-95123 Catania, Italy
[5] Univ Catania, Dipartimento Fis & Astron, I-95123 Catania, Italy
[6] Samsung Semicond Inc, San Jose, CA 95134 USA
[7] Heriot Watt Univ, Sch Engn & Phys Sci, Inst Mech Proc & Energy Engn, Edinburgh EH14 4AS, Midlothian, Scotland
关键词
SELF-INTERSTITIALS; MECHANISMS; SILICON; DEFECTS;
D O I
10.1063/1.4929762
中图分类号
O59 [应用物理学];
学科分类号
摘要
The authors of the above paper call into question recent evidence on the properties of self-interstitials, I, in Ge [Cowern et al., Phys. Rev. Lett. 110, 155501 (2013)]. We show that this judgment stems from invalid model assumptions during analysis of data on B marker-layer diffusion during proton irradiation, and that a corrected analysis fully supports the reported evidence. As previously stated, I-mediated self-diffusion in Ge exhibits two distinct regimes of temperature, T: high-T, dominated by amorphous-like mono-interstitial clusters-i-morphs-with self-diffusion entropy approximate to 30 k, and low-T, where transport is dominated by simple self-interstitials. In a transitional range centered on 475 degrees C both mechanisms contribute. The experimental I migration energy of 1.84 +/- 0.26 eV reported by the Munster group based on measurements of self-diffusion during irradiation at 550 degrees C < T < 680 degrees C further establishes our proposed i-morph mechanism. (C) 2015 AIP Publishing LLC.
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页数:3
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