Orientational Dependence in Device Performances of InAs and Si Nanowire MOSFETs Under Ballistic Transport

被引:12
作者
Shimoida, Kenta [1 ]
Yamada, Yoshihiro [1 ]
Tsuchiya, Hideaki [1 ,2 ]
Ogawa, Matsuto [1 ]
机构
[1] Kobe Univ, Dept Elect & Elect Engn, Grad Sch Engn, Kobe, Hyogo 6578501, Japan
[2] Japan Sci & Technol Agcy, CREST, Tokyo 1020075, Japan
关键词
Ballistic transport; current drive; high-mobility semiconductors; nanowire (NW) transistors; power delay product (PDP); quantum capacitance (QC); tight-binding (TB) approach; TECHNOLOGICALLY SIGNIFICANT SEMICONDUCTORS; MONTE-CARLO-SIMULATION; ZINCBLENDE STRUCTURES; SILICON NANOWIRE; DIAMOND;
D O I
10.1109/TED.2012.2228199
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We evaluate drive currents and consumption powers of InAs and Si nanowire metal-oxide-semiconductor field-effect transistors (MOSFETs) with various crystal orientations, by using a ballistic MOSFET model coupled with tight-binding band structure calculation. We demonstrate that performance dependence on the wire orientation is not significant in InAs NWFETs compared to Si NWFETs, due to an isotropic nature of the Gamma valley, and furthermore, a lower power switching is expected in InAs NWFETs even if the gate oxide thickness reduces down to a quantum capacitance limit. The present results suggest that InAs NWFETs have the advantage over the Si counterpart in terms of lower power operation and flexibility in layout design of integrated circuits.
引用
收藏
页码:117 / 122
页数:6
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