Growth of di-indenoperylene single crystals on amino-functionalized SiO2 surfaces

被引:9
作者
Zhang, Xue Na [1 ]
Barrena, Esther [1 ,2 ]
de Oteyza, Dimas Garcia [1 ]
De Souza, Emerson [1 ]
Dosch, Helmut [1 ,2 ]
机构
[1] Max Planck Inst Met Res, D-70569 Stuttgart, Germany
[2] Univ Stuttgart, Inst Theoret & Angew Phys, D-70550 Stuttgart, Germany
关键词
annealing; atomic force microscopy; monolayers; organic semiconductors; self-assembly; semiconductor growth; semiconductor thin films; semiconductor-insulator boundaries; silicon compounds; surface morphology; wetting; X-ray diffraction;
D O I
10.1063/1.2977726
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report a combined atomic force microscopy/x-ray diffraction study of the growth and dewetting of the organic molecule di-indenoperylene (DIP) on SiO2 surfaces that have been functionalized with an amino-terminated self-assembled monolayer of 3-aminopropyltriethoxysilane [APS, (CH3CH2O)(3)Si(CH2)(3)NH2]. We disclose a transition of DIP thin films from two-dimensional to three-dimensional growth at 80 degrees C, which is associated with a change in the surface morphology of APS during the annealing of the substrates. This growth scenario gives rise to the formation of micron sized DIP single crystals, which could be potentially interesting for future application in electronic devices.
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页数:4
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