Spice models for amorphous silicon and polysilicon thin film transistors

被引:0
作者
Shur, MS
Jacunski, MD
Slade, HC
Owusu, AA
Ytterdal, T
Hack, M
机构
来源
PROCEEDINGS OF THE THIRD SYMPOSIUM ON THIN FILM TRANSISTOR TECHNOLOGIES | 1997年 / 96卷 / 23期
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D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We describe physically based analytical models for n-channel a-Si:H Thin Film Transistors (TFTs) and for n- and p-channel polysilicon TFTs. The models cover all regimes of transistor operation: leakage, subthreshold, above threshold conduction, and the kink regime in polysilicon TFTs. The models contain a minimum number of parameters which are easily extracted and can be readily related to the structural and material properties of the TFTs. The models have been verified for a large number of devices to scale properly with device geometry. Both models and accompanying automatic parameter extraction software are available over the internet.
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页码:242 / 259
页数:18
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