Oxidation behavior of Cr-Al-N-O thin films prepared by pulsed laser deposition

被引：25
|
作者：
Hirai, M [1 ]
Saito, H [1 ]
Suzuki, T [1 ]
Suematsu, H [1 ]
Jiang, WH [1 ]
Yatsui, K [1 ]
机构：
[1] Nagaoka Univ Technol, Extreme Energy Dens Res Inst, Nagaoka, Niigata 9402188, Japan
来源：
THIN SOLID FILMS | 2002年 / 407卷 / 1-2期
关键词：
chromium aluminum oxynitride; coatings; NaCl structure; oxidation;
D O I：
10.1016/S0040-6090(02)00024-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Chromium aluminum oxynitride (Cr-Al-N-O) films have been successfully prepared by pulsed laser deposition (PLD). Experiments were carried out by changing the surface area ratio of the target [SR = S-AlN/(S-Cr2N+S-AlN)] under a pressure of 1 x 10(-5) torr. The composition of the film prepared at fluence of F = 5 J/cm(2) and Si-R = 75% was determined to be Cr0.11Al0.39N0.25O0.25 by Rutherford backscattering spectroscopy (RBS). The oxidation of the Cr-Al-N-O film was observed above 900 degreesC. Additionally, the film heat-treated at 1100 degreesC consisted mainly of B1 (NaCl) structure. From the result of grazing angle X-ray difftactometry (GXRD), the oxidation resistant of Cr-Al-N-O film was found to be improved due to the fact that Cr2O3 and alpha-Al2O3 is formed near the film surface. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：122 / 125
页数：4
相关论文
共 50 条
  • [41] Deposition of MgF2 Thin Films by Pulsed Laser Ablation Technique
    Lorusso, Antonella
    Gontad, Francisco
    Perrone, Alessio
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (08)
  • [42] Femtosecond Pulsed Laser Deposition of Chromium Diboride-Rich Thin Films
    De Bonis, Angela
    Galasso, Agostino
    Latini, Alessandro
    Rau, Julietta V.
    Santagata, Antonio
    Curcio, Mariangela
    Teghil, Roberto
    COATINGS, 2019, 9 (12)
  • [43] Wear tests of ZrC and ZrN thin films grown by pulsed laser deposition
    Dorcioman, G.
    Socol, G.
    Craciun, D.
    Argibay, N.
    Lambers, E.
    Hanna, M.
    Taylor, C. R.
    Craciun, V.
    APPLIED SURFACE SCIENCE, 2014, 306 : 33 - 36
  • [44] High-repetition rate pulsed laser deposition of ZrC thin films
    Craciun, D.
    Socol, G.
    Stefan, N.
    Mihailescu, I. N.
    Bourne, G.
    Craciun, V.
    SURFACE & COATINGS TECHNOLOGY, 2009, 203 (08) : 1055 - 1058
  • [45] Oxygen in Complex Oxide Thin Films Grown by Pulsed Laser Deposition: a Perspective
    Koster, Gertjan
    Blank, Dave H. A.
    Rijnders, Guus A. J. H. M.
    JOURNAL OF SUPERCONDUCTIVITY AND NOVEL MAGNETISM, 2020, 33 (01) : 205 - 212
  • [46] Oxygen in Complex Oxide Thin Films Grown by Pulsed Laser Deposition: a Perspective
    Gertjan Koster
    Dave H. A. Blank
    Guus A. J. H. M. Rijnders
    Journal of Superconductivity and Novel Magnetism, 2020, 33 : 205 - 212
  • [47] Effect of aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive crossed beam pulsed laser deposition
    Escobar-Alarcon, L.
    Solis-Casados, D. A.
    Romero, S.
    Fernandez, M.
    Perez-Alvarez, J.
    Haro-Poniatowski, E.
    APPLIED SURFACE SCIENCE, 2013, 283 : 808 - 812
  • [48] Microstructure and nanoindentation hardness of TiN/AlN multilayer films prepared by pulsed laser deposition
    Tang, P. H.
    Song, R. G.
    Chai, G. Z.
    Mao, J.
    SURFACE ENGINEERING, 2012, 28 (03) : 165 - 170
  • [49] Special Issue "Pulsed Laser Deposition of Thin Films: Recent Advances and Challenge"
    Axente, Emanuel
    Socol, Gabriel
    COATINGS, 2022, 12 (03)
  • [50] Formation of the chemical composition of transition metal dichalcogenide thin films at pulsed laser deposition
    Fominski, V. Yu.
    Romanov, R. I.
    Gnedovets, A. G.
    Nevolin, V. N.
    TECHNICAL PHYSICS, 2010, 55 (10) : 1509 - 1516
12345