Fabrication of Superhydrophobic and Oleophobic Surfaces with Overhang Structure by Reverse Nanoimprint Lithography

被引:153
作者
Choi, Hak-Jong [1 ]
Choo, Soyoung [1 ]
Shin, Ju-Hyeon [1 ]
Kim, Kang-In [2 ]
Lee, Heon [1 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul, South Korea
[2] SK Hynix, Div Res & Dev, Icheon Si, Gyeonggi Do, South Korea
基金
新加坡国家研究基金会;
关键词
SELF-ASSEMBLED MONOLAYER; SUPER-WATER-REPELLENT; RESISTANCE; MUSHROOM; DESIGN;
D O I
10.1021/jp4070399
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This work reports the fabrication of superhydrophobic and oleophobic surfaces with an overhang structure by reverse nanoimprint lithography. An overhang structure is difficult to fabricate by conventional lithography; however, it was conveniently formed by reverse imprint lithography, employed in conjunction with reactive ion etching. The obtained overhang structure was coated with a fluoroalkylsilane monolayer to reduce its surface energy. Further, four different types of nanopatterns were separately embedded on the surface of the obtained overhang structure by modified reverse imprint lithography to enhance its oil-repelling properties. The embedded nanopatterns resulted in different overhang angles, thereby enhancing the oil-repelling properties. The morphology and wetting characteristics of the overhang structure were investigated by scanning electron microscopy and contact angle measurements. This study demonstrates that an overhang structure can be successfully fabricated on a substrate by reverse nanoimprint lithography; moreover, oleophobic structures can be realized using materials with contact angles <90 degrees
引用
收藏
页码:24354 / 24359
页数:6
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