Dense Arrays of Highly Aligned Graphene Nanoribbons Produced by Substrate-Controlled Metal-Assisted Etching of Graphene

被引：36

作者：

Solis-Fernandez, Pablo ^{[1
]}

Yoshida, Kazuma ^{[2
]}

Ogawa, Yui ^{[2
]}

Tsuji, Masaharu ^{[1
]}

Ago, Hiroki ^{[1
]}

机构：

[1] Kyushu Univ, IMCE, Fukuoka 8168580, Japan

[2] Kyushu Univ, Grad Sch Engn Sci, Fukuoka 8168580, Japan

来源：

ADVANCED MATERIALS | 2013年 / 25卷 / 45期

关键词：

graphene; graphene nanoribbon; nanodevices; etching; patterning; WALLED CARBON NANOTUBES; SINGLE-LAYER GRAPHENE; RAMAN-SPECTROSCOPY; ATOMIC STRUCTURES; GROWTH; HYDROGENATION; TRANSISTORS; SAPPHIRE; GRAPHITE; BANDGAP;

D O I：

10.1002/adma.201302619

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Dense arrays of aligned graphene nanoribbons (GNRs) are fabricated by substrate-controlled etching of large-area single-layer graphene. An adequate choice of etching substrate and catalyst deposition method allows densities up to 25 nanoribbons μm-1 to be obtained with average widths of 19 nm. The efficacy of the method is evidenced by the high on/off ratios of back-gated transistors made with these GNRs, which can go up to 5000. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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收藏

页码：6562 / 6568

页数：7

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