Detailed analysis of the microwave-detected photoconductance decay in crystalline silicon

被引:70
作者
Lauer, K. [1 ,2 ]
Laades, A. [1 ]
Ubensee, H. [1 ]
Metzner, H. [1 ]
Lawerenz, A. [1 ]
机构
[1] CiS Inst Mikrosensorik GmbH, SolarZentrum Erfurt, D-99099 Erfurt, Germany
[2] Tech Univ Ilmenau, Inst Phys, D-98693 Ilmenau, Germany
关键词
carrier density; carrier lifetime; dark conductivity; electron-hole recombination; elemental semiconductors; high-frequency effects; interstitials; photoconductivity; silicon; surface recombination;
D O I
10.1063/1.3021459
中图分类号
O59 [应用物理学];
学科分类号
摘要
An approach to evaluate the microwave-detected photoconductance decay (MWPCD) is developed, which allows to extract the minority carrier lifetime as a function of the excess carrier density from a single MWPCD measurement. The method is shown to be applicable to thin (w less than or similar to 200 mu m) silicon wafers with low minority carrier recombination at the surfaces and bulk lifetimes in the range of about 1-100 mu s. Comparison of the MWPCD results with minority carrier lifetime measurements using the quasi-steady-state photoconductance method reveals very good agreement between both types of measurement. Only when the photoconductance exceeds 30% of the dark conductivity, is a deviation observed, because then the MWPCD signal is no longer directly proportional to the excess carrier density. Minority carrier trapping is found to affect the MWPCD signal only in the tail of the measured photoconductance decay. The evaluation method is used to map the interstitial iron content with high spatial resolution, as well as to determine the minority carrier trap density. An excellent agreement between numerical simulation and measured MWPCD signal is found revealing the assumptions made for the evaluation approach to be valid. This evaluation of the MWPCD measurement is well suited to characterize silicon of low purity and low crystalline quality, which is often employed to solar cells with high spatial resolution.
引用
收藏
页数:9
相关论文
共 35 条
[1]   Injection level lifetime spectroscopy of impurities in semiconductors [J].
Ahrenkiel, RK ;
Keyes, BM ;
Johnston, S .
SURFACE ENGINEERING, 2000, 16 (01) :54-60
[2]  
BASORE PA, 1990, P 21 IEEE PHOT SPEC, P374
[3]  
Beatti A. R., 1958, P PHYS SOC LOND A, V429, P16
[4]   NOTE ON THE INTERPRETATION OF INJECTION-LEVEL-DEPENDENT SURFACE RECOMBINATION VELOCITIES [J].
BRENDEL, R .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1995, 60 (05) :523-524
[5]   Experimental verification of the effect of depletion-region modulation on photoconductance lifetime measurements [J].
Cousins, PJ ;
Neuhaus, DH ;
Cotter, JE .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (04) :1854-1858
[6]   AUGER COEFFICIENTS FOR HIGHLY DOPED AND HIGHLY EXCITED SILICON [J].
DZIEWIOR, J ;
SCHMID, W .
APPLIED PHYSICS LETTERS, 1977, 31 (05) :346-348
[7]   Optimum sensitivity and two-dimensional modeling of microwave detected photoconductance decay carrier lifetime measurement [J].
Ghannam, MY ;
Mahmoud, SF ;
Nijs, JF .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (06) :2665-2673
[8]  
GILES FP, 1993, P 23 IEEE PHOT SPEC, P299
[9]   THE PROPERTIES OF IRON IN SILICON [J].
GRAFF, K ;
PIEPER, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) :669-674
[10]  
GUPTA DC, 1998, STP1340 ASTM