Method to test rotationally asymmetric surface deviation with high accuracy

被引:25
作者
Song, Weihong [1 ,2 ]
Wu, Fan [1 ]
Hou, Xi [1 ]
机构
[1] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
[2] Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1364/AO.51.005567
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We have proposed a new absolute method to test rotationally asymmetric surface deviation. Relying on the high accuracy of Zernike polynomial fitting with least-squares algorithm for the low-frequency component and preserving the high-frequency component with the averaging method, the new method can guarantee the high accuracy of the measurement result with fewer rotational measurements compared to the traditional multiangle averaging method. It realizes a balance between the accuracy and efficiency of the measurements. It has been verified by experiments; the root mean square (rms) of residual figure between the two methods is similar to 0.6 nm. Meanwhile, the new method can suppress environmental noise introduced in measurement results well. (C) 2012 Optical Society of America
引用
收藏
页码:5567 / 5572
页数:6
相关论文
共 14 条
  • [1] Chen X., 2010, ACTA METEROL SIN, V31, P219
  • [2] Test optics error removal
    Evans, CJ
    Kestner, RN
    [J]. APPLIED OPTICS, 1996, 35 (07): : 1015 - 1021
  • [3] ABSOLUTE CALIBRATION OF AN OPTICAL FLAT
    FRITZ, BS
    [J]. OPTICAL ENGINEERING, 1984, 23 (04) : 379 - 383
  • [4] Absolute measurement of planarity with Fritz's method: uncertainty evaluation
    Greco, V
    Tronconi, R
    Del Vecchio, C
    Trivi, M
    Molesini, G
    [J]. APPLIED OPTICS, 1999, 38 (10) : 2018 - 2027
  • [5] Interferometric testing of optical surfaces: Absolute measurements of flatness
    Hariharan, P
    [J]. OPTICAL ENGINEERING, 1997, 36 (09) : 2478 - 2481
  • [6] Ichikawa H., 1999, U.S. patent, Patent No. [5,982,490, 5982490]
  • [7] Kim S.-W., 2000, INT J KOREAN SOC PRE, V1, P115
  • [8] Malacara D., 2007, OPTICAL SHOP TESTING
  • [9] Moler C. B., 2004, Numerical computing with MATLAB
  • [10] Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror
    Otaki, K
    Yamamoto, T
    Fukuda, Y
    Ota, K
    Nishiyama, I
    Okazaki, S
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (01): : 295 - 300