Wide band gap of Strontium doped Hafnium oxide nanoparticles for optoelectronic device applications - Synthesis and characterization

被引:10
作者
Manikantan, J. [1 ]
Ramalingam, H. B. [2 ]
Shekar, B. Chandar [3 ]
Murugan, B. [4 ]
Kumar, R. Ranjith [5 ]
Santhoshif, J. Sai [6 ]
机构
[1] Sri Ranganathar Inst Engn & Technol, Dept Phys, Coimbatore, Tamil Nadu, India
[2] Govt Arts Coll, Dept Phys, Udumalpet, Tamil Nadu, India
[3] Kongunadu Coll Arts & Sci, Dept Phys, Nanotechnol Res Lab, Coimbatore, Tamil Nadu, India
[4] Govt Arts Coll, Dept Phys, Nilgiris, Tamil Nadu, India
[5] Nilgiris Educ & Res Fdn, Div Res, Nilgiris, Tamil Nadu, India
[6] INFO Inst Engn, Dept Chem, Coimbatore, Tamil Nadu, India
关键词
Nanoparticles; FTIR; Optical materials and properties; PRECIPITATION METHOD; FILMS; DEPOSITION; MEMORY;
D O I
10.1016/j.matlet.2016.08.026
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Strontium doped HfO2 nanoparticles (Sr-HfO2 NPs) were synthesized by a simple co-precipitation method. FTIR and EDAX spectroscopy analysis shows stoichiometries compositions of HfO2 NPs are pure. X-Ray diffraction pattern analysis revealed that the calcined NPs shown the polycrystalline nature of the orthorhombic phase structure. TEM analysis revealed that the morphology of the calcined NPs was spherical in shape with less agglomeration and the crystallite size was about 30 rim. UV-visible spectroscopy analysis revealed that the optical band gap energy of calcined NPs was 5.4 eV.
引用
收藏
页码:42 / 44
页数:3
相关论文
共 16 条
[1]   Modulation of the structural and optical properties of sputtering-derived HfO2 films by deposition power [J].
Deng, B. ;
He, G. ;
Lv, J. G. ;
Chen, X. F. ;
Zhang, J. W. ;
Zhang, M. ;
Sun, Z. Q. .
OPTICAL MATERIALS, 2014, 37 :245-250
[2]   Precursor control of crystal structure and stoichiometry in twin metal oxide nanocrystals [J].
Depner, Sean W. ;
Kort, Kenneth R. ;
Banerjee, Sarbajit .
CRYSTENGCOMM, 2009, 11 (05) :841-846
[3]   Evolution of materials technology for stacked-capacitors in 65 nm embedded-DRAM [J].
Gerritsen, E ;
Emonet, N ;
Caillat, C ;
Jourdan, N ;
Piazza, M ;
Fraboulet, D ;
Boeck, B ;
Berthelot, A ;
Smith, S ;
Mazoyer, P .
SOLID-STATE ELECTRONICS, 2005, 49 (11) :1767-1775
[4]   Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3 [J].
Hoex, B. ;
Heil, S. B. S. ;
Langereis, E. ;
van de Sanden, M. C. M. ;
Kessels, W. M. M. .
APPLIED PHYSICS LETTERS, 2006, 89 (04)
[5]   Integrating functional oxides with graphene [J].
Hong, X. ;
Zou, K. ;
DaSilva, A. M. ;
Ahn, C. H. ;
Zhu, J. .
SOLID STATE COMMUNICATIONS, 2012, 152 (15) :1365-1374
[6]   Hafnia sol-gel films synthesized from HfCl4:: Changes of structure and properties with the firing temperature [J].
Kidchob, Tongjit ;
Malfatti, Luca ;
Serra, Filomena ;
Falcaro, Paolo ;
Enzo, Stefano ;
Innocenzi, Plinio .
JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, 2007, 42 (01) :89-93
[7]   Alternative dielectrics to silicon dioxide for memory and logic devices [J].
Kingon, AI ;
Maria, JP ;
Streiffer, SK .
NATURE, 2000, 406 (6799) :1032-1038
[8]   Synthesis and characterization of HfO2 nanoparticles by sonochemical approach [J].
Ramadoss, Ananthakumar ;
Kim, Sang Jae .
JOURNAL OF ALLOYS AND COMPOUNDS, 2012, 544 :115-119
[9]   Novel synthesis of hafnium oxide nanoparticles by precipitation method and its characterization [J].
Ramadoss, Ananthakumar ;
Krishnamoorthy, Karthikeyan ;
Kim, Sang Jae .
MATERIALS RESEARCH BULLETIN, 2012, 47 (09) :2680-2684
[10]   Facile synthesis of hafnium oxide nanoparticles via precipitation method [J].
Ramadoss, Ananthakumar ;
Krishnamoorthy, Karthikeyan ;
Kim, Sang Jae .
MATERIALS LETTERS, 2012, 75 :215-217