Fully Analytical Compact Model for the I-V Characteristics of Resonant Tunneling Diodes

被引:2
作者
Celino, Daniel R. [1 ]
de Souza, Adelcio M. [1 ]
Plazas, Caio L. M. P. [1 ]
Ragi, Regiane [1 ]
Romero, Murilo A. [1 ]
机构
[1] Univ Sao Paulo, EESC USP, Dept Elect & Comp Engn, Sao Carlos, Brazil
来源
35TH SYMPOSIUM ON MICROELECTRONICS TECHNOLOGY AND DEVICES (SBMICRO2021) | 2021年
基金
巴西圣保罗研究基金会;
关键词
Compact Model; Analytical Modelling; Resonant Tunneling Diode; TCAD Simulation; MATERIAL PARAMETERS; TRANSPORT;
D O I
10.1109/SBMicro50945.2021.9585749
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a fully analytical physics-based model for the current-voltage (I-V) characteristics of resonant tunneling diodes. We consider the whole electrical potential distribution in the structure, including the space charge regions in the emitter and collector layers. Additionally, we account for scattering mechanisms experienced by carriers during tunneling through the double barrier region as a function of the applied bias voltage. The model is validated with experimental and numerical data, yielding excellent agreement
引用
收藏
页数:4
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