Recess-Free AlGaN/GaN Lateral Schottky Barrier Controlled Schottky Rectifier with Low Turn-on Voltage and High Reverse Blocking

被引:0
作者
Kang, Xuanwu [1 ]
Wang, Xinhua [1 ]
Huang, Sen [1 ]
Zhang, Jinhan [1 ]
Fan, Jie [1 ]
Yang, Shuo [1 ]
Wang, Yuankun [1 ]
Zheng, Yingkui [1 ]
Wei, Ke [1 ]
Zhi, Jin [1 ]
Liu, Xinyu [1 ]
机构
[1] Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China
来源
PRODCEEDINGS OF THE 2018 IEEE 30TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD) | 2018年
基金
国家重点研发计划;
关键词
AlGaN/GalV; Schottky-barrier-diode; SBD; Lateral; high breakdown voltage; low turn-on voltage;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-performance A1GaN/GaN-on-Si diodes are fabricated with lateral Schottky barrier controlled Schottky rectifier (LSBS) on thin-barrier (5nm) A1GaN/GaN heterostructures, which features a recess-free process, enabling better electrostatic control to pinch off the channel under the anode region. In this way, low leakage currents (3 orders of magnitude lower than conventional recessed Schottky-barrier-diode (SBD)) and a high reverse breakdown voltage of 1700 V (410 A/mm) are reached, together with a low onset voltage of only 0.37 V and a record low on-state resistance Roem of 1 macm2 for GaN-based SBDs with an Anode-to-Cathode distance (LAC) of 10 nm. This is attributed to the combination of an effectively preserved 2DEG by LPCVD SiNx passivation and a hybrid Schottky /Ohmic anode. Thanks to the recess free technology and low damage in the Schottky region, stable preliminary HTRB performance are obtained. The proposed diode fabrication is compatible with GaN depletion/enhancement MIS-HEMTs process flow, enabling integration in the promising smart GaN platform.
引用
收藏
页码:280 / 283
页数:4
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