Electroless Displacement Deposition of Noble Metal on Silicon Powder for Recovering from Urban Mines

被引:3
作者
Fukuda, Kenji [1 ]
Fukumuro, Naoki [1 ]
Sakamoto, Susumu [1 ,2 ]
Yae, Shinji [1 ]
机构
[1] Univ Hyogo, Grad Sch Engn, Dept Mat Sci & Chem, Himeji, Hyogo 6712280, Japan
[2] Nippon Oikos Co Ltd, Kitakyushu, Fukuoka 8070805, Japan
来源
ELECTROLESS PLATING: PRINCIPLES AND APPLICATIONS 3 | 2014年 / 61卷 / 10期
关键词
OPEN-CIRCUIT DEPOSITION; FLUORIDE SOLUTIONS; POROUS SILICON; HF; NICKEL; CEMENTATION; BEHAVIOR; GOLD;
D O I
10.1149/06110.0001ecst
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We developed a simple recovery method of all noble metals from aqueous solutions by adding silicon (Si) powder and fluoride. This method is expected to be low-cost, because the Si powder and the fluoride solution can be supplied from semiconductor industries, such as the sawdust Si of wafering or dicing and the waste hydrofluoric acid solution of wafer cleaning or etching. In this study, we investigated the recovery of noble metals using a low-toxic agent instead of a toxic hydrofluoric acid, or sawdust Si powder. This method can recover noble metals using ammonium fluoride or sodium fluoride. The recovery rate with sawdust Si is as high as that using pure Si powder. We found that the recovery of noble metals by this method from aqueous solutions including aqua regia is also possible.
引用
收藏
页码:1 / 7
页数:7
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