Modified atomic layer deposition of MoS2 thin films

As one of the most attractive transition metal dichalcogenides (TMDs), the growth of molybdenum disulfide (MoS2) with industrial compatibility is of great importance. Atomic layer deposition (ALD) has been shown to be a promising method to achieve the growth of high-quality TMD materials. However, MoS2 films deposited by ALD often are amorphous with nonideal stoichiometry and require hightemperature post-deposition annealing. In this study, we introduce a modified ALD recipe using Mo(CO)(6) and H2S, resulting in controllable linear growth behavior, a S-to-Mo ratio of 2:1, and crystalline films at a temperature as low as 190 degrees C. The growth mechanisms and key factors leading to this improvement are proposed and complemented by kinetics calculations. This newly developed methodology relies on aligning the process time with the reaction kinetics of carbonyl disassociation. The MoS2 films prepared herein were shown to be active hydrogen evolution reaction catalysts. Published under license by AVS.