Monolithic integration of ultraviolet light emitting diodes and photodetectors on a p-GaN/AlGaN/GaN/Si platform

被引:35
|
作者
Lyu, Qifeng [1 ]
Jiang, Huaxing [1 ]
Lau, Kei May [1 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Peoples R China
关键词
Silicon - III-V semiconductors - Photodetectors - Monolithic integrated circuits - High electron mobility transistors - Photons - Two dimensional electron gas - Aluminum alloys - Aluminum gallium nitride - Light emitting diodes;
D O I
10.1364/OE.418843
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this letter, we report the first demonstration of monolithically integrated ultraviolet (UV) light emitting diodes (LEDs) and visible-blind UV photodetectors (PDs) employing the same p-GaN/AlGaN/GaN epi-structures grown on Si. Due to the radiative recombination of holes from the p-GaN layer with electrons from the 2-D electron gas (2DEG) accumulating at the AlGaN/GaN heterointerface, the forward biased LED with p-GaN/AlGaN/GaN junction exhibits uniform light emission at 360 nm. Facilitated by the high-mobility 2DEG channel governed by a p-GaN optical gate, the visible-blind phototransistor-type PDs show a low dark current of similar to 10(-7) mA/mm and a high responsivity of 3.5x10(5) A/W. Consequently, high-sensitivity photo response with a large photo-to-dark current ratio of over 10(6) and a response time less than 0.5 s is achieved in the PD under the UV illumination from the on-chip adjacent LED. The demonstrated simple integration scheme of high-performance UV PDs and LEDs shows great potential for various applications such as compact opto-isolators. (C) 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
引用
收藏
页码:8358 / 8364
页数:7
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