Comparative study on the oxidation resistance between Ti-Al-Si-N and Ti-Al-N coatings

被引：7

作者：

Kim, Jung Wook ^{[1
]}

Abraham, Sudeep ^{[1
]}

Kim, Kwang Ho ^{[1
]}

Sung, Jang Hyun ^{[2
]}

Moore, John. J. ^{[3
]}

机构：

[1] Pusan Natl Univ, Div Mat Sci & Engn, Pusan 609735, South Korea

[2] Dong A Univ, Dept Met & Mat Sci, Busan 604714, South Korea

[3] Colorado Sch Mines, Dept Met & Mat Engn, Golden, CO 80401 USA

来源：

HEAT TREATMENT OF MATERIALS | 2006年 / 118卷

关键词：

oxidation; Ti-Al-Si-N; Ti-Al-N; Al2O3; layer; SiO2;

D O I：

10.4028/www.scientific.net/SSP.118.317

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

High-temperature oxidation behaviors of Ti-Al-Si-N and Ti-Al-N films were comparatively investigated in this work. Two kinds of Ti0.75Al0.25N and Ti0.69Al0.23Si0.08N films were deposited on WC-Co substrates by a DC magnetron sputtering method using separate Ti3Al(99.9%) and Si(99.99%) targets in a gaseous mixture of Ar and N-2. Si addition of 8 at.% into Ti-Al-N film modified its microstructure to a fine composite comprising, Ti-Al-N crystallites and amorphous Si3N4, and to a smoother surface morphology. While the solid solution Ti0.75Al0.25N film had superior oxidation resistance up to around 700 degrees C, the composite Ti-Al-Si-N film showed further enhanced oxidation resistance. Both Al2O3 and SiO2 layers played roles as a barrier against oxygen diffusion for the quaternary Ti-Al-Si-N film, whereas only the Al2O3 oxide layer formed at surface did a role for the Ti-Al-N film. Oxidation behavior and mechanical stability of the films after oxidation were compared between two films using instrumental analyses such as XRD, GDOES, XPS, and scratch test.

引用

页码：317 / +

页数：3

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