Plasma-enhanced chemical vapor deposition of amorphous fluorocarbon polymer films (a-C:F) on spherical surfaces

被引：1

作者：

Biloiu, Costel ^{[1
]}

Sakai, Yosuke ^{[2
]}

机构：

[1] Varian Semicond Equipment Associates, Gloucester, MA 01930 USA

[2] Hokkaido Univ, Grad Sch Informat Sci & Technol, Sapporo, Hokkaido 0600814, Japan

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2008年 / 36卷 / 04期

基金：

日本学术振兴会;

关键词：

fluorocarbon polymer film; plasma enhanced chemical vapor deposition; RF capacitively coupled plasma;

D O I：

10.1109/TPS.2008.926844

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

An RF capacitively coupled reactor designed for plasma-enhanced chemical vapor deposition of amorphous fluorocarbon polymer films on spherical surfaces is described. Pictures of the plasma created between the concentrically spherical electrodes, the film surface, and a cross section of the film are presented.

引用

页码：890 / 891

页数：2

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