Ab initio calculations of SiC/metal interfaces

被引:1
作者
Kohyama, M [1 ]
Hoekstra, J [1 ]
机构
[1] AIST, Osaka Natl Res Inst, Dept Mat Phys, Osaka 5638577, Japan
来源
INTERGRANULAR AND INTERPHASE BOUNDARIES IN MATERIALS, IIB98 | 1999年 / 294-2卷
关键词
ceramic/metal interface; density-functional theory; first-principles molecular dynamics method; adhesive energy; Schottky-Barrier height; SiC; Al; Ti; TiC;
D O I
10.4028/www.scientific.net/MSF.294-296.95
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The SiC(001)/Al and SiC(001)/Ti interfaces have been studied using the ab initio pseudopotential method. For each system, the C-terminated and Si-terminated interfaces have quite different features from each other, such as atomic configurations, bonding nature, bond adhesion and electronic properties. For the C-terminated interface of the SiC/Al system, the C-Al bond with covalent and ionic characters generates large adhesive energy as well as large interfacial dipole, which greatly affects the Schottky-barrier height. For the C-terminated interface of the SiC/Ti system, the interfacial C and Ti layers have features rather similar to TIC compounds because of the strong covalent interactions between C 2p and Ti 3d orbitals.
引用
收藏
页码:95 / 98
页数:4
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