Trap exploration of ZnO-based resistance switching memory devices

被引:0
|
作者
Chiu, Fu-Chien [1 ]
Chang, Wen-Yuan
Li, Peng-Wei [1 ]
Chen, Chih-Chi [1 ]
Chiang, Wen-Ping [1 ]
机构
[1] Ming Chuan Univ, Dept Elect Engn, Tao Yuan 333, Taiwan
来源
PROCEEDINGS OF THE 2013 IEEE 5TH INTERNATIONAL NANOELECTRONICS CONFERENCE (INEC) | 2013年
关键词
ZnO; resistive switching; trap spacing;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The trap exploration of Pt/ZnO/Pt memory cells was made. Based on the temperature dependence of I-V characteristics, the conduction mechanisms in ZnO films are dominated by the hopping conduction and ohmic conduction in high-resistance state (HRS) and low-resistance state (LRS), respectively. Simulation results show that the trap spacing and trap energy level in HRS are around 2 run and 0.46 eV, respectively. Also, the Fermi level, the electron mobility, and the effective density of states in conduction band in LRS in ZnO films are extracted.
引用
收藏
页码:234 / 235
页数:2
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