Deterministically Placed Quantum Dots for Quantum Nanophotonics

The ability to achieve deterministic placement of semiconductor quantum dots (QDs) opens up interesting possibilities for nanophotonic devices. By incorporating these QDs within microcavities, light-matter interaction can be tailored and enhanced, enabling phenomenon such as spontaneous emission enhancement, low threshold lasing, single photon emission and strong-coupling. The quality of these phenomena relies on the distribution of emission wavelengths of the emitter dipoles and the strength of their coupling to internal fields of the cavity. Therefore size-controlled fabrication of QDs and their deterministic placement become quite important. In this work we will describe a photoelectrochemical-based etching of III-nitride materials to achieve QDs with uniform emission wavelength. By patterning using electron beam lithography to create a nanopost structure in an epitaxially grown III-nitride based quantum well structure, we will show potential for deterministic placement. The photoluminescence response from the nanopost structure after photoelectrochemical etching reveals sharp lines indicative of quantum dot formation.