Multi-dipolar microwave plasmas and their application to negative ion production

被引:36
作者
Bechu, S. [1 ]
Soum-Glaude, A. [1 ,2 ]
Bes, A. [1 ]
Lacoste, A. [1 ]
Svarnas, P. [3 ]
Aleiferis, S. [1 ,3 ]
Ivanov, A. A., Jr. [4 ,5 ]
Bacal, M. [4 ,5 ]
机构
[1] Univ Grenoble 1, CNRS, IN2P3, LPSC,Grenoble INP, F-38026 Grenoble, France
[2] Tecnosud, PROMES CNRS, F-66100 Perpignan, France
[3] Univ Patras, Dept Elect & Comp Engn, High Voltage Lab, Rion 26504, Greece
[4] UPMC, LPP, Ecole Polytech, Palaiseau, France
[5] Univ Paris 11, UMR CNRS 7648, Orsay, France
关键词
CHEMICAL-VAPOR-DEPOSITION; THIN-FILMS; DENSITY; DESIGN; ECR;
D O I
10.1063/1.4823466
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
During the past decade multi-dipolar plasmas have been employed for various purposes such as surface treatments in biomedicine, physical and chemical vapour deposition for hydrogen storage, and applications in mechanical engineering. On the other hand, due to the design and operational mode of these plasma sources (i.e., strong permanent magnets for the electron cyclotron resonance coupling, low working pressure, and high electron density achieved) they are suitable for studying fundamental mechanisms involved in negative ion sources used in magnetically confined fusion and particle accelerators. Thus, this study presents an overview of fundamental results obtained with: (i) a single dipolar source, (ii) a network of seven dipolar plasma sources inserted into a magnetic multipolar chamber (Camembert III), and (iii) four dipolar sources housed in a smaller metallic cylinder (ROSAE III). Investigations with Langmuir probes of electron energy probability functions revealed the variation of the plasma properties versus the radial distance from the axis of a dipolar source in its mid plane and allowed the determination of the proportion between hot and cold electron populations in both chambers. These results are compared with the density of hydrogen negative ions, measured using the photodetachment technique. Electron energy probability functions obtained in these different configurations show the possibility of both hot and cold electron production. The former is a prerequisite for increasing the vibrational level of molecules and the dissociation degree and the latter for producing negative ions via dissociative attachment of the cold electrons or via surface production induced by H atoms. (C) 2013 AIP Publishing LLC.
引用
收藏
页数:8
相关论文
共 28 条
[1]   Electron energy distribution function and plasma parameters across magnetic filters [J].
Aanesland, A. ;
Bredin, J. ;
Chabert, P. ;
Godyak, V. .
APPLIED PHYSICS LETTERS, 2012, 100 (04)
[2]   A Langmuir probe system for high power RF-driven negative ion sources on high potential [J].
不详 .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2009, 18 (01)
[3]   Photodetachment diagnostic techniques for measuring negative ion densities and temperatures in plasmas [J].
Bacal, M .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2000, 71 (11) :3981-4006
[4]  
Bacal M, 2005, AIP CONF PROC, V763, P203, DOI 10.1063/1.1908296
[5]   NEGATIVE-ION PRODUCTION IN HYDROGEN PLASMAS CONFINED BY A MULTICUSP MAGNETIC-FIELD [J].
BACAL, M ;
BRUNETEAU, AM ;
NACHMAN, M .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (01) :15-24
[6]   DISSOCIATIVE ATTACHMENT AND VIBRATIONAL-EXCITATION IN LOW-ENERGY COLLISIONS OF ELECTRONS WITH H-2 AND D2 [J].
BARDSLEY, JN ;
WADEHRA, JM .
PHYSICAL REVIEW A, 1979, 20 (04) :1398-1405
[7]  
Burke R., 1992, MICROWAVE EXCITED PL, P273
[8]   Laser photodetachment on a high power, low pressure rf-driven negative hydrogen ion source [J].
Christ-Koch, S. ;
Fantz, U. ;
Berger, M. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2009, 18 (02)
[9]   INVESTIGATION OF A LARGE-VOLUME NEGATIVE HYDROGEN-ION SOURCE [J].
COURTEILLE, C ;
BRUNETEAU, AM ;
BACAL, M .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1995, 66 (03) :2533-2540
[10]   Control and monitoring of optical thin films deposition in a Matrix Distributed Electron Cyclotron Resonance reactor [J].
Daineka, D ;
Kouznetsov, D ;
Bulkin, P ;
Girard, G ;
Bourée, JE ;
Drévillon, B .
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2004, 28 (03) :343-346