Mixed TiO2-SiO2 mesostructured thin films

被引:14
作者
Bosc, F [1 ]
Ayral, A [1 ]
Guizard, C [1 ]
机构
[1] Univ Montpellier 2, CNRS, ENSCM, Inst Europeen Membranes,UMR 5635, F-34095 Montpellier, France
关键词
mesostructured thin layers; mixed TiO2-SiO2 thin layers; photocatalytic activity;
D O I
10.1016/j.tsf.2005.08.186
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Mixed TiO2-SiO2 thin layers exhibiting an ordered mesoporosity are prepared for future photocatalytic applications. They are synthesized from a nanocrystalline anatase hydrosol, tetraethylorthosilicate as silica source and triblock copolymers as mesostructuring agent. It has been previously demonstrated that the preparation of mesoporous anatase-based thin layers is possible at low temperature (423 K) by using the photodegradation of the templating mesophases. Layer consolidation is required before a possible application. Polymerized silica can be used as inorganic binder to improve the stability of such low-temperature layers. The effect of addition of silica on the crystalline structure, on the mesostructure, on the porosity and on the photocatalytic activity is here presented and discussed. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:252 / 256
页数:5
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