Sensitivity calibration of an imaging extreme ultraviolet spectrometer-detector system for determining the efficiency of broadband extreme ultraviolet sources

被引：15

作者：

Fuchs, S. ^{[1
,2
]}

Roedel, C. ^{[1
,2
]}

Krebs, M. ^{[3
]}

Haedrich, S. ^{[2
,3
]}

Bierbach, J. ^{[1
,2
]}

Paz, A. E. ^{[1
,2
]}

Kuschel, S. ^{[1
]}

Wuensche, M. ^{[1
]}

Hilbert, V. ^{[1
]}

Zastrau, U. ^{[1
]}

Foerster, E. ^{[1
,2
]}

Limpert, J. ^{[2
,3
]}

Paulus, G. G. ^{[1
,2
]}

机构：

[1] Univ Jena, Inst Opt & Quantum Elect, D-07745 Jena, Germany

[2] Helmholtz Inst Jena, Jena, Germany

[3] Univ Jena, Inst Appl Phys, D-07745 Jena, Germany

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2013年 / 84卷 / 02期

关键词：

HARMONIC-GENERATION; SPECTROGRAPH;

D O I：

10.1063/1.4788732

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We report on the absolute sensitivity calibration of an extreme ultraviolet (XUV) spectrometer system that is frequently employed to study emission from short-pulse laser experiments. The XUV spectrometer, consisting of a toroidal mirror and a transmission grating, was characterized at a synchrotron source in respect of the ratio of the detected to the incident photon flux at photon energies ranging from 15.5 eV to 99 eV. The absolute calibration allows the determination of the XUV photon number emitted by laser-based XUV sources, e. g., high-harmonic generation from plasma surfaces or in gaseous media. We have demonstrated high-harmonic generation in gases and plasma surfaces providing 2.3 mu W and mu J per harmonic using the respective generation mechanisms. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4788732]

引用

页数：5

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