X-ray properties and interface study of B4C/Mo and B4C/Mo2C periodic multilayers

被引：13

作者：

Choueikani, F. ^{[1
]}

Bridou, F. ^{[1
]}

Lagarde, B. ^{[2
]}

Meltchakov, E. ^{[1
]}

Polack, F. ^{[2
]}

Mercere, P. ^{[2
]}

Delmotte, F. ^{[1
]}

机构：

[1] Univ Paris Sud, CNRS, Lab Charles Fabry, Inst Opt, F-91127 Palaiseau, France

[2] Synchrotron SOLEIL, F-91192 Gif Sur Yvette, France

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2013年 / 111卷 / 01期

关键词：

MO/SI MULTILAYERS; DIFFUSION BARRIER; MIRRORS; REFLECTIVITY; STABILITY; LAYERS;

D O I：

10.1007/s00339-013-7560-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present a comparative study of B4C/Mo and B4C/Mo2C periodic multilayer structures deposited by magnetron sputtering. The characterization was performed by grazing incidence X-ray reflectometry at two different energies and high resolution transmission electron microscopy. The experimental results indicate the existence of an interdiffusion layer at the B4C-on-Mo interface in the B4C/Mo system. Thus, the B4C/Mo multilayers were modeled by an asymmetric structure with three layers in each period. The thickness of B4C-on-Mo interfacial layer was estimated about 1.1 nm. The B4C/Mo2C multilayers present less interdiffusion and are well modeled by a symmetric structure without interfacial layers. This study shows that B4C/Mo2C structure is an interesting alternative to B4C/Mo multilayer for X-ray optic applications.

引用

页码：191 / 198

页数：8

共 29 条

[1] Improved reflectance and stability of Mo-Si multilayers [J].

Bajt, S ;

Alameda, JB ;

Barbee, TW ;

Clift, WM ;

Folta, JA ;

Kaufmann, B ;

Spiller, EA .

OPTICAL ENGINEERING, 2002, 41 (08) :1797-1804

[2]

Bajt S., 2001, US Patent Application, Patent No. [US 6,229,652 B1, 6229652]

[3] Thermal and stress studies of normal incidence Mo/B4C multilayers for a 6.7 nm wavelength [J].

Barthelmess, Miriam ;

Bajt, Sasa .

APPLIED OPTICS, 2011, 50 (11) :1610-1619

[4] Thermal stability of Mo/Si multilayers with boron carbide interlayers [J].

Böttger, T ;

Meyer, DC ;

Paufler, P ;

Braun, S ;

Moss, M ;

Mai, H ;

Beyer, E .

THIN SOLID FILMS, 2003, 444 (1-2) :165-173

[5] Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors [J].

Braun, S ;

Mai, H ;

Moss, M ;

Scholz, R ;

Leson, A .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6B) :4074-4081

[6]

Bridou F, 1994, J Xray Sci Technol, V4, P200, DOI [10.1016/S0895-3996(05)80058-8, 10.3233/XST-1993-4304]

[7] AUTOMATIC CHARACTERIZATION OF LAYERS STACKS FROM REFLECTIVITY MEASUREMENTS - APPLICATION TO THE STUDY OF THE VALIDITY-CONDITIONS OF THE GRAZING X-RAYS REFLECTOMETRY [J].

BRIDOU, F ;

PARDO, BA .

JOURNAL OF OPTICS-NOUVELLE REVUE D OPTIQUE, 1990, 21 (04) :183-191

[8] Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems [J].

de Rooij-Lohmann, V. I. T. A. ;

Yakshin, A. E. ;

van de Kruijs, R. W. E. ;

Zoethout, E. ;

Kleyn, A. W. ;

Keim, E. G. ;

Gorgoi, M. ;

Schaefers, F. ;

Brongersma, H. H. ;

Bijkerk, F. .

JOURNAL OF APPLIED PHYSICS, 2010, 108 (01)

[9] Chemical interaction of B4C, B, and C with Mo/Si layered structures [J].

de Rooij-Lohmann, V. I. T. A. ;

Veldhuizen, L. W. ;

Zoethout, E. ;

Yakshin, A. E. ;

van de Kruijs, R. W. E. ;

Thijsse, B. J. ;

Gorgoi, M. ;

Schaefers, F. ;

Bijkerk, F. .

JOURNAL OF APPLIED PHYSICS, 2010, 108 (09)

[10] Diffusion and interaction studied nondestructively and in real-time with depth-resolved low energy ion spectroscopy [J].

de Rooij-Lohmann, V. I. T. A. ;

Kleyn, A. W. ;

Bijkerk, F. ;

Brongersma, H. H. ;

Yakshin, A. E. .

APPLIED PHYSICS LETTERS, 2009, 94 (06)

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