Reactions of water and methanol at hydrogen-terminated silicon surfaces studied by transmission FTIR

被引:38
作者
Bateman, JE
Horrocks, BR
Houlton, A
机构
[1] Department of Chemistry, University of Newcastle Upon Tyne, Newcastle upon Tyne
来源
JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS | 1997年 / 93卷 / 14期
关键词
D O I
10.1039/a701286a
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A simple method for studying the reactivity of hydrogen-terminated silicon surfaces via transmission FTIR spectroscopy is described. Abraded (100) single crystals of silicon, after etching in ammonium fluoride, show features in the IR spectrum that are assigned to Si-H stretching vibrations. Confirmation of the utility of this approach is demonstrated in the reactions of the Si-H surfaces with water and methanol. Native-oxide growth in the former case is evidenced by the appearance of two bands in the Si-O stretch region accompanied by a shift to higher frequency of the longitudinal polar Si-O vibrational mode with increased exposure, consistent with an island-growth model. Similarly, the reaction with methanol generates two bands in the Si-O stretch region. However, the frequency and behaviour of these bands on further exposure to methanol are consistent with a chemisorbed methoxy species with little oxidation taking place, contrary to previous reports.
引用
收藏
页码:2427 / 2431
页数:5
相关论文
共 32 条
[1]   CHEMICAL SURFACE MODIFICATION OF POROUS SILICON [J].
ANDERSON, RC ;
MULLER, RS ;
TOBIAS, CW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (05) :1393-1396
[2]   Alkylation of Si surfaces using a two-step halogenation Grignard route [J].
Bansal, A ;
Li, XL ;
Lauermann, I ;
Lewis, NS ;
Yi, SI ;
Weinberg, WH .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1996, 118 (30) :7225-7226
[3]   INFRARED ABSORPTION AT LONGITUDINAL OPTIC FREQUENCY IN CUBIC CRYSTAL FILMS [J].
BERREMAN, DW .
PHYSICAL REVIEW, 1963, 130 (06) :2193-&
[4]   THE CHEMICAL OXIDATION OF HYDROGEN-TERMINATED SILICON(111) SURFACES IN WATER STUDIED IN-SITU WITH FOURIER-TRANSFORM INFRARED-SPECTROSCOPY [J].
BOONEKAMP, EP ;
KELLY, JJ ;
VANDEVEN, J ;
SONDAG, AHM .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (12) :8121-8127
[5]   A STUDY OF THIN SILICON DIOXIDE FILMS USING INFRARED-ABSORPTION TECHNIQUES [J].
BOYD, IW ;
WILSON, JIB .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (06) :4166-4172
[6]   INFRARED-SPECTROSCOPY OF SI(111) SURFACES AFTER HF TREATMENT - HYDROGEN TERMINATION AND SURFACE-MORPHOLOGY [J].
BURROWS, VA ;
CHABAL, YJ ;
HIGASHI, GS ;
RAGHAVACHARI, K ;
CHRISTMAN, SB .
APPLIED PHYSICS LETTERS, 1988, 53 (11) :998-1000
[7]   SURFACE METHOXYLATION AS THE KEY FACTOR FOR THE GOOD PERFORMANCE OF N-SI/METHANOL PHOTOELECTROCHEMICAL CELLS [J].
CHAZALVIEL, JN .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1987, 233 (1-2) :37-48
[8]  
CHESTERS MA, 1989, ASI SERIS B, V198
[9]   DIRECT FUNCTIONALIZATION OF SILICON VIA THE SELF-ASSEMBLY OF ALCOHOLS [J].
CLELAND, G ;
HORROCKS, BR ;
HOULTON, A .
JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS, 1995, 91 (21) :4001-4003
[10]   ELECTRON-ENERGY-LOSS CHARACTERIZATION OF THE H-TERMINATED SI(111) AND SI(100) SURFACES OBTAINED BY ETCHING IN NH4F [J].
DUMAS, P ;
CHABAL, YJ .
CHEMICAL PHYSICS LETTERS, 1991, 181 (06) :537-543