Aging of Ultra-Thin Niobium Films

被引：3

作者：

Santavicca, Daniel ^{[1
]}

Prober, Daniel ^{[2
]}

机构：

[1] Univ North Florida, Dept Phys, Jacksonville, FL 32224 USA

[2] Dept Appl Phys, New Haven, CT 06520 USA

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 2015年 / 25卷 / 03期

基金：

美国国家航空航天局;

关键词：

Nanofabrication; niobium; superconducting devices; superconducting thin films; RESISTIVE STATE; NOISE; TEMPERATURE; PHOTON; NB;

D O I：

10.1109/TASC.2014.2363628

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We characterize the evolution of the electrical properties of ultra-thin niobium films stored in ambient conditions over a period of approximately seven months. Patterned films with thicknesses between 8 and 16 nm were fabricated via electronbeam deposition on unheated silicon substrates using a lift-off process. The film quality is similar to previous results obtained with sputter deposition onto unheated silicon substrates. The increase of the resistance and the decrease of the superconducting critical temperature are well described by an exponential function with a time constant of approximately 37 days.

引用

页数：4

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