Influence of oxygen partial pressure on the microstructural and magnetic properties of Er-doped ZnO thin films

被引:11
作者
Chen, Wei-Bin [1 ,2 ]
Liu, Xue-Chao [1 ]
Li, Fei [1 ,2 ]
Chen, Hong-Ming [1 ,2 ]
Zhou, Ren-Wei [1 ,2 ]
Shi, Er-Wei [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 201800, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
基金
中国国家自然科学基金;
关键词
FERROMAGNETISM; STRAIN; OXIDE;
D O I
10.1063/1.4922141
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Er-doped ZnO thin films have been prepared by using inductively coupled plasma enhanced physical vapor deposition at different O-2:Ar gas flow ratio (R = 0:30, 1:30, 1:15, 1:10 and 1:6). The influence of oxygen partial pressure on the structural, optical and magnetic properties was studied. It is found that an appropriate oxygen partial pressure (R=1:10) can produce the best crystalline quality with a maximum grain size. The internal strain, estimated by fitting the X-ray diffraction peaks, varied with oxygen partial pressure during growth. PL measurements show that plenty of defects, especially zinc vacancy, exist in Er-doped ZnO films. All the samples show room-temperature ferromagnetism. Importantly, the saturation magnetization exhibits similar dependency on oxygen partial pressure with the internal strain, which indicates that internal strain has an important effect on the magnetic properties of Er-doped ZnO thin films. (C) 2015 Author(s).
引用
收藏
页数:7
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