Elastic Constants and Pressure Derivative of Elastic Constants of Si1-xGex Solid Solution

被引:0
作者
Jivani, A. R. [1 ]
Baria, J. K. [1 ]
Vyas, P. S. [1 ]
Jani, A. R.
机构
[1] VP & RPTP Sci Coll, Dept Phys, Vallabh Vidyanagar 388120, Gujarat, India
来源
SOLID STATE PHYSICS, VOL 57 | 2013年 / 1512卷
关键词
Pseudopotential method; Si1-xGex solid solutions; the pseudo-alloy atom model; elastic constants; pressure derivatives of elastic constants;
D O I
10.1063/1.4791411
中图分类号
O59 [应用物理学];
学科分类号
摘要
Elastic properties of Si1-xGex solid solution with arbitrary (atomic) concentration (x) are studied using the pseudo-alloy atom model based on the pseudopotential theory and on the higher-order perturbation scheme with the application of our own proposed model potential. We have used local-field correction function proposed by Sarkar et al to study Si-Ge system. The Elastic constants and pressure derivatives of elastic constants of the solid solution is investigated with different concentration x of Ge. It is found in the present study that the calculated numerical values of the aforesaid physical properties of Si-Ge system are function of x. The elastic constants (C-11, C-12 and C-44) decrease linearly with increase in concentration x and pressure derivative of elastic constants (C-11', C-12' and C-44') increase with the concentration x of Ge. This study provides better set of theoretical results for such solid solution for further comparison either with theoretical or experimental results.
引用
收藏
页码:1062 / 1063
页数:2
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