Improved Thermal Stability and Electrical Properties for Al-Sb-Te Based Phase-Change Memory

被引:11
作者
Peng, Cheng [1 ,2 ]
Wu, Liangcai [1 ]
Rao, Feng [1 ,2 ]
Song, Zhitang [1 ]
Yang, Pingxiong [2 ]
Cheng, Limin [1 ]
Li, Juntao [1 ]
Zhou, Xilin [1 ]
Zhu, Min [1 ]
Liu, Bo [1 ]
Chu, Junhao [2 ]
机构
[1] Chinese Acad Sci, State Key Lab Funct Mat Informat & Nanotechnol La, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
[2] E China Normal Univ, Dept Elect, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
基金
中国国家自然科学基金;
关键词
RANDOM-ACCESS MEMORY; NUCLEATION; GROWTH; FILMS;
D O I
10.1149/2.014202ssl
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Phase-change alloys AlSbTe were investigated for material and electrical properties. A peak crystallization temperature of 236 degrees C was found with 16.7 at.% Al doping Sb3Te (AST-16.7%), which showed a 10-year data retention temperature up to 131 degrees C and a melting point as low as 542 degrees C. The phase-change memory device based on AST-16.7% showed good reversible switching characteristics as operation time below 100 ns and low power consumption. Importantly, dramatically rapid SET operation with a shortest pulse width of 7 ns was achieved. (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.014202ssl] All rights reserved.
引用
收藏
页码:P38 / P41
页数:4
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