Effect of He/Ne/Ar on EUV emission and Xe plasma pumped by capillary discharge

被引：3

作者：

Xu, Qiang ^{[1
]}

Zhao, Yongpeng ^{[1
]}

Liu, Yang ^{[1
]}

Li, Qi ^{[1
]}

Wang, Qi ^{[1
]}

机构：

[1] Harbin Inst Technol, Natl Key Lab Sci & Technol Tunable Laser, Harbin 150001, Peoples R China

来源：

EUROPEAN PHYSICAL JOURNAL D | 2013年 / 67卷 / 06期

基金：

中国国家自然科学基金;

关键词：

LASER; XENON; POWER;

D O I：

10.1140/epjd/e2013-30500-5

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The influence of the He, Ne and Ar on Xe plasma pumped by capillary discharge process is studied theoretically and experimentally. The charge-state populations and average ionization of Xe as a function of electron temperature for pure Xe and mixed gases are calculated with a collision-radiation model. The emission of Xe10+ 4d(8)-4d(7)5p 13.5 nm in 2% bandwidth is obtained by a EUV emission monitor (E-Mon). Additional He/Ne/Ar gas can influence on the time scale and the intensity of the appearance for the E-Mon signals by effecting the electron density and temperature.

引用

页数：5

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