Photocorrosion Mechanism of TiO2-Coated Photoanodes

被引：21

作者：

Didden, Arjen ^{[1
]}

Hillebrand, Philipp ^{[2
]}

Dam, Bernard ^{[1
]}

van de Krol, Roel ^{[1
,2
]}

机构：

[1] Delft Univ Technol, Fac Sci Appl, Mat Energy Convers & Storage, NL-2628 BL Delft, Netherlands

[2] Helmholtz Zentrum Berlin Mat & Energie GmbH, Inst Solar Fuels, D-14109 Berlin, Germany

来源：

INTERNATIONAL JOURNAL OF PHOTOENERGY | 2015年 / 2015卷

关键词：

ATOMIC LAYER DEPOSITION; CORROSION PROTECTION; FILMS; PHOTOCURRENT; PERFORMANCE; DISSOLUTION;

D O I：

10.1155/2015/457980

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Atomic layer deposition was used to coat CdS photoanodes with 7 nm thick TiO2 films to protect them from photocorrosion during photoelectrochemical water splitting. Photoelectrochemical measurements indicate that the TiO2 coating does not provide full protection against photocorrosion. The degradation of the film initiates from small pinholes and shows oscillatory behavior that can be explained by an Avrami-type model for photocorrosion that is halfway between 2D and 3D etching. XPS analysis of corroded films indicates that a thin layer of CdS remains present on the surface of the corroded photoanode that is more resilient towards photocorrosion.

引用

页数：8

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